Process for defining a pattern using an anti-reflective coating and structure therefor
First Claim
1. A process for defining a pattern in a surface which comprises:
- providing on said surface a layer of hard mask material;
depositing an inorganic anti-reflective coating on said layer of hard mask material;
applying a photoresist layer above said anti-reflective coating;
patterning said photoresist layer;
patterning said antireflective coating;
patterning said layer of hard mask material;
removing the remaining portions of said photoresist layer;
removing the remaining portions of said anti-reflective layer by etching the remaining portions thereof; and
then patterning said surface using the hard mask as a mask.
1 Assignment
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Accused Products
Abstract
A pattern in a surface is defined by providing on the surface a hard mask material; depositing an anti-reflective coating on the hard mask material; applying a photoresist layer on the anti-reflective coating; patterning the photoresist layer, anti-reflective layer and hard mask material; and removing the remaining portions of the photoresist layer and anti-reflective layer; and then patterning the substrate using the hard mask as the mask. Also provided is a structure for defining a pattern in a surface which comprises a surface having a hard mask material thereon; an anti-reflective coating located on the hard mask material; and a photoresist located on the anti-reflective coating. Also provided is an etchant composition for removing the hard mask material which comprises an aqueous composition of HF and chlorine.
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Citations
18 Claims
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1. A process for defining a pattern in a surface which comprises:
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providing on said surface a layer of hard mask material; depositing an inorganic anti-reflective coating on said layer of hard mask material; applying a photoresist layer above said anti-reflective coating; patterning said photoresist layer; patterning said antireflective coating; patterning said layer of hard mask material; removing the remaining portions of said photoresist layer; removing the remaining portions of said anti-reflective layer by etching the remaining portions thereof; and then patterning said surface using the hard mask as a mask. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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Specification