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Method for manufacturing a sensor

  • US 6,030,850 A
  • Filed: 02/25/1998
  • Issued: 02/29/2000
  • Est. Priority Date: 10/11/1995
  • Status: Expired due to Term
First Claim
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1. A method for manufacturing a sensor, comprising the steps of:

  • sequentially depositing on a substrate, a first insulating layer, a conducting layer directly in contact with said first insulating layer, a second insulating layer directly in contact with said conducting layer, and a silicon layer directly in contact with said second insulating layer;

    patterning the conducting layer and the second insulating layer before deposition of a subsequent layer;

    introducing trenches into the silicon layer, the trenches extending from a top side of the silicon layer to the second insulating layer; and

    applying an etching medium through the trenches to the second insulating layer.

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