Micromachined acceleration and coriolis sensor

• US 6,032,531 A
• Filed: 08/04/1997
• Issued: 03/07/2000
• Est. Priority Date: 08/04/1997
• Status: Expired due to Term

• Current Assignee: Kearfott Corp. (Astronautics Corporation of America)
• Original Assignee: Kearfott Guidance and Navigation Corporation
• Inventors: Roszhart, Terry V.
• Primary Examiner(s): Williams, Hezron
• Assistant Examiner(s): Kwok, Helen C.
• Application Number:
  US08/906,218
• Time in Patent Office: 946 Days
• Field of Search: 73/504.02, 73/504.03, 73/504.04, 73/504.12, 73/504.14, 73/504.15, 73/514.02, 73/514.15, 73/514.16, 73/514.29 , 73/514.34, 73/514.35
• US Class Current: 73/504.04
• CPC Class Codes: G01C 19/56 Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
• CPC Class Codes: G01P 15/0802 Details
• CPC Class Codes: G01P 15/097 by vibratory elements
• CPC Class Codes: G01P 15/18 in two or more dimensions

Abstract

A solid state silicon micromachined acceleration and Coriolis (MAC) sensor that measures linear and angular motion. The MAC sensor is a single device that performs the functions of a conventional accelerometer and a gyroscope simultaneously. The MAC sensor is unique in that it is a differential dual stage device using only one micromachined proof mass to measure both linear and angular motions. The single proof mass is connected to opposing electromechanical resonators in a monolithic microstructure made from single crystal silicon. This unique design offers improvements in measurement performance and reductions in fabrication complexity that are beyond the state the art of earlier micromachined inertial sensors.

Claims

1. A micromachined sensor for measuring linear and angular motion, said sensor comprising:

a generally planar substrate, wherein said substrate is generally aligned in a wafer plane defined by a first axis and a second axis, wherein said second axis is orthogonal to said first axis, wherein said substrate is generally perpendicular to a third axis which is orthogonal to said wafer plane, and wherein said substrate is formed to include;

a frame having an inner cavity;

a proof mass disposed in said inner cavity, said proof mass having a top surface and a bottom surface;

flexural support means for connecting said proof mass to said frame and suspending said proof mass within said cavity; and

a plurality of resonators, including at least two opposite resonators which are disposed on opposite sides of said proof mass;

excitation means for vibrating said proof mass at a dither frequency;

sensing means for sensing the vibration of said resonators; and

means for mounting said excitation means and said sensing means adjacent said proof mass;

wherein said proof mass is capable of vibrating outside said wafer plane;

whereby said proof mass is capable of applying linear acceleration and rotational Coriolis forces, or displacements caused thereby, to said resonators in response to linear and angular motion of said sensor.

2. The sensor according to claim 1 wherein said plurality of resonators further comprises at least two offset resonators which are disposed on different planes, said different planes being generally parallel to said wafer plane.

3. The sensor according to claim 1 wherein plurality of resonators further comprises at least two coplanar resonators.

4. The sensor according to claim 1 wherein linear movement of said sensor along said third axis causes said proof mass to modulate resonant frequencies of said resonators, wherein a vibration frequency around a natural resonant frequency of one of said resonators increases while a vibration frequency around a natural resonant frequency of an opposite resonator decreases, and wherein the difference in vibrational frequency around the natural resonant frequency between said resonators is proportional to a translation of said sensor along said third axis.

5. The sensor according to claim 1 wherein rotational movement of said sensor about said third axis creates Coriolis forces which induce an oscillating torque on said proof mass about said first axis, thereby causing said proof mass to modulate a vibration frequency of said resonators, wherein the vibration frequency of a first resonator is increased while the vibration frequency of a second resonator decreases, wherein the difference in vibration frequency of said first and second resonators is proportional to a rotation rate of said sensor about said third axis.

6. The sensor according to claim 1 wherein said means for vibrating said proof mass further comprises means for rotationally dithering said proof mass about said second axis at said dither frequency.

7. The sensor according to claim 1 wherein said plurality of resonators further comprises:

a first resonator disposed proximate said top surface of said proof mass and generally along said second axis; and

a second resonator disposed proximate said bottom surface of said proof mass and generally along said second axis.

8. The sensor according to claim 1 wherein the natural resonant frequencies of said resonators are substantially equal.

9. The sensor according to claim 1 wherein said mounting means further comprises a pair of caps, each cap having an inner surface and an outer surface, wherein said inner surface is provided with a well, wherein said generally planar substrate is disposed between said caps and attached thereto, and wherein said wells are adapted to allow said proof mass to vibrate outside said wafer plane.

10. The sensor according to claim 9 wherein said means for vibrating said proof mass further comprises:

a plurality of electrodes disposed in at least one of said wells and adjacent said proof mass, said plurality of electrodes including at least one proof mass driver electrode for providing electrostatic forces to said proof mass thereby causing said proof mass to vibrate at said dither frequency;

electronic circuitry, connected to said plurality of electrodes, for exciting said plurality of electrodes and for sensing modulations in vibration frequencies of said plurality of resonators caused by the linear acceleration and rotational Coriolis forces so as to produce acceleration and rotation signals indicative of the linear and angular motion of said sensor; and

means for connecting said electronic circuitry to said plurality of electrodes.

11. The sensor according to claim 10 wherein said plurality of electrodes further comprise a plurality of proof mass balance electrodes.

12. The sensor according to claim 11 wherein said balance electrodes further comprise a plurality of diagonal balance electrodes.

13. The sensor according to claim 10 further comprising means for damping proof mass resonance about said first axis in order to improve dynamic response.

14. The sensor according to claim 13 wherein said proof mass resonance damping means further comprises means for applying an oscillating voltage to said electrodes.

15. The sensor according to claim 10 wherein said at least one driver electrode rotationally dithers said proof mass about said second axis at said dither frequency.

16. The sensor according to claim 10 wherein said means for connecting said electronic circuitry to said plurality of electrodes further comprises at least one electroplated feedthrough hole disposed through at least one of said caps;

and wherein said feedthrough hole is adapted to supply electrical energy to said electrodes.

17. The sensor according to claim 1 wherein at least one of said resonators further comprises a cantilever beam having a proximal end attached to said proof mass and a free distal end extending into said cavity.

18. The sensor according to claim 1 wherein a vibration frequency corresponding to a linear movement is modulated about a frequency which differs from said dither frequency.

19. The sensor according to claim 1 further comprising means for decoupling resonator modes of opposed said resonators.

20. The sensor according to claim 1 wherein at least two of said resonators have a frequency mismatch.

21. The sensor according to claim 1 wherein said sensor is adapted to exhibit a diagonal inertia tensor, equal rotational frequencies.

22. The sensor according to claim 1 wherein said flexural support means further comprises a first plurality of opposed flexural supports generally disposed in a first plane, wherein said first plane is generally parallel to said wafer plane.

23. The sensor according to claim 22 wherein said flexural support means further comprises a second plurality of opposed flexural supports generally disposed in a second plane, wherein said second plane is generally parallel to said wafer plane, and wherein said second plane is offset from said first plane.

24. The sensor according to claim 23 wherein said flexural support means further comprises a plurality of diagonally opposed flexural supports.

25. The sensor according to claim 24 wherein said diagonally opposed flexural supports further comprises four supports.

26. The sensor according to claim 24 wherein said diagonally opposed flexural supports further comprises eight supports.

27. The sensor according to claim 24 wherein said diagonally opposed flexural supports are coplanar.

28. The sensor according to claim 1 further comprising at least one body attached to said proof mass, whereby the mass and at least one moment of inertia of said proof mass is increased.

29. The sensor according to claim 28 wherein said body is bonded to said proof mass.

30. The sensor according to claim 28 wherein said body further comprises at least two opposing bodies attached to opposite sides of said proof mass.

31. The sensor according to claim 28 wherein said body is generally spherical.

32. The sensor according to claim 28 wherein said means for mounting said excitation means and said sensing means adjacent said proof mass further comprises at least one throughhole adapted to allow at least a portion of said body to extend therethrough.

33. The sensor according to claim 10 wherein said electronic circuitry further comprises a proof mass oscillator for exciting said proof mass through said plurality of electrodes.

34. The sensor according to claim 33 wherein said proof mass oscillator senses a first natural resonant frequency of said proof mass and provides a reference frequency output relating thereto.

35. The sensor according to claim 10 wherein said electronic circuitry further comprises resonator oscillator means for exciting said resonators.

36. The sensor according to claim 35 wherein said resonator oscillator means sense modulations in said plurality of resonators and provides frequency modulated outputs related thereto.

37. The sensor according to claim 36 wherein said electronic circuitry further comprises demodulators for processing said frequency modulated outputs and for providing linear acceleration signals and rotational velocity signals.

38. The sensor according to claim 37 wherein said electronic circuitry further comprises a differential synchronous detector for processing said rotational velocity signals and for providing differential rotational velocity signals.

39. The sensor according to claim 37 wherein said electronic circuitry further comprises a differential frequency counter for processing said linear acceleration signals and for providing differential linear acceleration signals.