Metallic thin flim and method of manufacturing the same, and surface acoustic wave device using the metallic thin film and the method thereof
First Claim
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1. A method of forming a thin film electrode for use in a surface acoustic wave device, said method comprising the steps of:
- forming an amorphous layer of an electrode material on a surface of a piezoelectric substrate while irradiating said surface of the piezoelectric substrate with an ion beam; and
forming at least one of a single crystal layer of said electrode material and an oriented layer of said electrode material on a surface of said amorphous layer while irradiating said surface of said amorphous layer with said ion beam.
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Abstract
By using a dual ion-beam sputtering apparatus, an aluminum thin-film is formed on a glass substrate made of an amorphous material. While radiating an ion beam for assisting the film formation from an ion source onto the glass substrate, the aluminum thin-film is formed by depositing the sputtering ions which are generated by radiating an ion beam onto an aluminum target.
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Citations
10 Claims
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1. A method of forming a thin film electrode for use in a surface acoustic wave device, said method comprising the steps of:
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forming an amorphous layer of an electrode material on a surface of a piezoelectric substrate while irradiating said surface of the piezoelectric substrate with an ion beam; and forming at least one of a single crystal layer of said electrode material and an oriented layer of said electrode material on a surface of said amorphous layer while irradiating said surface of said amorphous layer with said ion beam. - View Dependent Claims (2, 3)
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4. A method of forming surface acoustic wave device, said method comprising the steps of:
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forming an amorphous layer of an electrode material on a surface of a piezoelectric substrate while irradiating said surface of said piezoelectric substrate with an ion beam; and forming at least one of a single crystal layer of said electrode material and an oriented layer of said electrode material on a surface of said amorphous layer while irradiating the surface of said amorphous layer with said ion beam. - View Dependent Claims (5, 6)
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7. A method of forming a thin film electrode for use in a surface acoustic wave device, said method comprising the steps of:
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ion-beam sputtering an amorphous layer of an electrode material on a surface of a piezoelectric substrate; ion-beam sputtering at least one of a monocrystal layer and an oriented layer of said electrode material on a surface of said amorphous layer; and radiating an ion beam towards said surface of said substrate during said ion-beam sputtering steps so as to assist in said formation said layers. - View Dependent Claims (8, 9, 10)
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Specification