Multiple loadlock system

• US 6,034,000 A
• Filed: 07/28/1997
• Issued: 03/07/2000
• Est. Priority Date: 07/28/1997
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Brezocsky, Thomas B., Heyder, Roger V., Davenport, Robert E.
• Primary Examiner(s): Niebling, John F.
• Assistant Examiner(s): Jones, Josetta I.
• Application Number:
  US08/901,485
• Time in Patent Office: 953 Days
• Field of Search: 438/908, 438/907
• US Class Current: 438/758
• CPC Class Codes: H01L 21/67778 involving loading and unloading of wafers
• CPC Class Codes: H01L 21/67781 Batch transfer of wafers
• CPC Class Codes: Y10S 414/137 including means for charging or discharging wafer cassette
• CPC Class Codes: Y10S 414/139 including wafer charging or discharging means for vacuum chamber
• CPC Class Codes: Y10S 438/908 Utilizing cluster apparatus

Abstract

A semiconductor processing system having a holding chamber coupled to a mainframe processing system and at least one loadlock chamber coupled to the holding chamber in which unprocessed wafers are transferred from the loadlock chamber to the holding chamber for subsequent processing by the mainframe system.

Claims

1. A method of processing semiconductor workpieces, comprising:

loading processed workpieces from a stack for workpieces in an evacuated holding chamber into a first cassette in an evacuated first chamber;

unloading unprocessed workpieces from a second cassette in an evacuated second chamber into a stack for workpieces in said holding chamber;

sealing said second chamber from said holding chamber;

venting said second chamber after said second chamber is sealed from said holding chamber; and

removing workpieces from said holding chamber and processing said removed workpieces while said second chamber is vented.

2. The method of claim 1 further comprising loading unprocessed workpieces into said second cassette of said second chamber after said second chamber is vented.

3. The method of claim 2 further comprising pumping down said second chamber after unprocessed workpieces are loaded into said second cassette.

4. The method of claim 1 further comprising:

sealing said holding chamber from said holding chamber;

venting said first chamber after said first chamber is sealed from said holding chamber;

removing workpieces from said holding chamber and processing said removed workpieces while said first chamber is vented.

5. The method of claim 4 further comprising unloading processed workpieces from said first chamber after said first chamber is vented.

6. The method of claim 5 further comprising pumping down said first chamber after processed workpieces have been unloaded from said first chamber.

7. The method of claim 1 wherein said holding chamber has two stacks of unprocessed workpieces and said processing comprises taking two workpieces from said holding chamber stacks of unprocessed workpieces, processing said two workpieces in at least two processing chambers to turn said two workpieces into two processed workpieces and returning said two processed workpieces to said holding chamber stacks.

12. The method of claim 1 wherein said loading of workpieces is performed using a transfer robot stationed within said holding chamber and having said stack which comprises a plurality of parallel blades positioned to hold workpieces in a stacked formation and adapted to transfer stacked workpieces simultaneously from said holding chamber to said first cassette in said first chamber.

13. The method of claim 12 wherein said unloading of workpieces is performed using said transfer robot.

19. The method of claim 1 wherein said processed workpieces loaded into said first cassette were previously unloaded as unprocessed wafers from said second cassette.

8. A method of processing semiconductor workpieces, comprising:

unloading at least two groups of unprocessed workpieces into an evacuated holding chamber from at least two cassettes in at least one first evacuated chamber;

processing at least two groups of unprocessed workpieces by;

removing two unprocessed workpieces at a time from said holding chamber;

processing said two removed workpieces in a mainframe system into two processed workpieces; and

returning said two processed workpieces to said holding chamber;

loading at least two groups of processed workpieces from said holding chamber into at least two cassettes in at least one second evacuated chamber;

sealing said first chamber from said holding chamber;

venting said first chamber after said first chamber is sealed from said holding chamber;

loading at least two groups of unprocessed workpieces into cassettes of said first chamber after said first chamber is vented;

pumping down said first chamber after unprocessed workpieces are loaded into said first cassettes;

sealing said second chamber from said holding chamber;

venting said second chamber after said second chamber is sealed from said holding chamber;

pumping down said second chamber after processed workpieces have been unloaded from said second chamber; and

processing workpieces from said holding chamber while said second chamber is vented.

9. A semiconductor workpiece processing system, comprising:

a mainframe chamber having a plurality of processing chambers coupled to said mainframe chamber;

a vacuum holding chamber coupled to said mainframe chamber for holding a lot of workpieces;

a first vacuum cassette chamber having a first cassette and coupled to said holding chamber; and

a lot transfer robot for transferring a lot of workpieces simultaneously from said cassette chamber to said holding chamber to be held for subsequent transfer to said mainframe chamber.

10. A semiconductor workpiece processing system, comprising:

a mainframe chamber having a plurality of processing chambers coupled to said mainframe chamber;

a vacuum holding chamber coupled to said mainframe chamber for holding a lot of workpieces;

an entry chamber having an entry cassette and coupled to said holding chamber;

an exit chamber having an exit cassette and coupled to said holding chamber; and

means for

     1) in a first cycle, a) transferring processed workpieces from said holding chamber to said exit cassette;

b) transferring unprocessed workpieces from said entry cassette to said holding chamber;

c) sealing said entry chamber from said holding chamber;

d) venting said entry chamber after said entry chamber is sealed from said holding chamber;

e) processing workpieces in said holding chamber while said entry chamber is vented;

f) loading unprocessed workpieces into said entry cassette of said entry chamber after said entry chamber is vented;

g) pumping down said entry chamber after unprocessed workpieces are loaded into said entry cassette; and

     2) in a second cycle, a) transferring processed workpieces from said holding chamber to said exit cassette;

b) transferring unprocessed workpieces from said entry cassette to said holding chamber;

c) sealing said exit chamber from said holding chamber;

d) venting said exit chamber after said exit chamber is sealed from said holding chamber;

e) processing workpieces in said holding chamber while said exit chamber is vented;

unloading processed workpieces from said exit cassette of said exit chamber after said exit chamber is vented; and

g) pumping down said exit chamber after processed workpieces have been unloaded from said exit chamber; and

     3) cyclicly repeating said first and second cycles.

11. A method of processing semiconductor workpieces comprising:

1) in a first cycle, a) transferring processed workpieces from an evacuated holding chamber to first and second cassettes in at least one evacuated exit chamber;

b) transferring unprocessed workpieces from third and fourth cassettes in at least one evacuated entry chamber to said holding chamber;

c) sealing said at least one entry chamber from said holding chamber;

d) venting said at least one entry chamber after said at least one entry chamber is sealed from said holding chamber;

e) processing workpieces in said holding chamber while said at least one entry chamber is vented;

f) loading unprocessed workpieces into said third and fourth cassettes of said at least one entry chamber after said at least one entry chamber is vented; and

g) pumping down said at least one entry chamber after unprocessed workpieces are loaded into said third and fourth cassettes;

2) in a second cycle, a) transferring processed workpieces from said holding chamber to said first and second cassettes;

b) transferring unprocessed workpieces from said third and fourth cassettes to said holding chamber;

c) sealing said at least one exit chamber from said holding chamber;

d) venting said at least one exit chamber after said at least one exit chamber is sealed from said holding chamber;

e) processing workpieces in said holding chamber while said at least one exit chamber is vented;

f) unloading processed workpieces from said first and second cassettes of said at least one exit chamber after said at least one exit chamber is vented; and

g) pumping down said at least one exit chamber after processed workpieces have been unloaded from said at least one exit chamber; and

3) cyclicly repeating said first and second cycles.

14. A method of processing semiconductor workpieces, comprising:

loading processed workpieces from a stack for workpieces in an evacuated holding chamber into a first cassette in an evacuated first chamber;

unloading unprocessed workpieces from a second cassette in an evacuated second chamber into a stack for workpieces in said holding chamber;

sealing said second chamber from said holding chamber;

venting said second chamber after said second chamber is sealed from said holding chamber;

removing workpieces from said holding chamber and processing said removed workpieces while said second chamber is vented; and

unloading unprocessed workpieces from a third cassette in an evacuated chamber into a second stack for workpieces in said holding chamber.

15. The method of claim 14 wherein said unloadings of workpieces from said second and third cassettes into said first and second stacks, respectively, in said holding chamber occur at the same time.

16. The method of claim 14 further comprising loading processed workpieces from said second stack to a fourth cassette in an evacuated chamber.

17. The method of claim 16 wherein said loadings of workpieces into said first and fourth cassettes from said first and second stacks, respectively, occur at the same time.

18. The method of claim 14 further comprising processing at least two stacks of unprocessed workpieces in said holding chamber by:

removing two unprocessed workpieces at a time from said first and second stacks, respectively, in said holding chamber;

processing said two removed workpieces in a mainframe system into two processed workpieces; and

returning said two processed workpieces at a time to said first and second stacks, respectively, in said holding chamber.