Surface position detecting system and device manufacturing method using the same
First Claim
1. A detecting system for detecting positional information related to a surface of an object, said detecting system comprising:
- a variable pattern generator for projecting an arbitrary pattern image on the surface of the object;
a light projecting optical system for projecting a pattern, defined by said variable pattern generator, to the surface of the object along an oblique direction;
a light receiving optical system for directing light from an image of the pattern; and
a light receiving element for detecting the light directed by said light receiving optical system, wherein surface position information about the surface of the object is detected on the basis of the detection by said light receiving element.
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Accused Products
Abstract
A detecting system for detecting positional information related to a surface of an object. The detecting system includes a variable pattern generator for projecting an arbitrary pattern image on the surface of the object, a light projecting optical system for projecting a pattern, defined by the variable pattern generator, to the surface of the object along an oblique direction, a light receiving optical system for directing light from an image of the pattern and a light receiving element for detecting the light directed by the light receiving optical system. Surface position information about the surface of the object is detected on the basis of the detection by the light receiving element.
77 Citations
42 Claims
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1. A detecting system for detecting positional information related to a surface of an object, said detecting system comprising:
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a variable pattern generator for projecting an arbitrary pattern image on the surface of the object; a light projecting optical system for projecting a pattern, defined by said variable pattern generator, to the surface of the object along an oblique direction; a light receiving optical system for directing light from an image of the pattern; and a light receiving element for detecting the light directed by said light receiving optical system, wherein surface position information about the surface of the object is detected on the basis of the detection by said light receiving element. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. An exposure apparatus for projecting a circuit pattern of a reticle onto a photosensitive substrate, said apparatus comprising:
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a projection optical system for performing the pattern projection; surface position information detecting means for detecting positional information about the surface of the photosensitive substrate, said surface position information detecting means comprising (i) a variable pattern generator for projecting an arbitrary pattern image on the surface of the substrate, (ii) a light projecting optical system for projecting a pattern, defined by said variable pattern generator, to the surface of the substrate along an oblique direction, (iii) a light receiving optical system for directing light from an image of the pattern, and (iv) a light receiving element for detecting the light directed by said light receiving optical system, wherein surface position information about the surface of the substrate is detected on the basis of the detection by said light receiving element; and a control system for controlling a position of the photosensitive substrate with respect to an optical axis of said projection optical system, in accordance with the detection by said surface position information detecting means. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. An electronic device manufacturing method, comprising the steps of:
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projecting a pattern, defined by a variable pattern generator, by projecting an arbitrary pattern image on the surface of a photosensitive substrate, with the variable pattern generator, in a direction inclined with respect to an optical axis of a projection optical system, whereby an image of the pattern is formed on the photosensitive substrate; directing light from the image of the pattern to a light receiving element; detecting the directed light, with the light receiving element; controlling the position of the photosensitive substrate with respect to an optical axis direction of the projection optical system, on the basis of the detection; exposing the position controlled photosensitive substrate to a circuit pattern through the projection optical system; developing the exposed photosensitive substrate; and forming a circuit on the developed substrate, whereby a device is produced.
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22. A detecting system for detecting positional information related to a surface of an object, said detecting system comprising:
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a light projecting optical system for projecting light to the surface of the object along an oblique direction, wherein a pattern image is formed on the surface of the object; a light receiving optical system for directing light from the pattern image; a light receiving element for detecting the light directed by said light receiving optical system, wherein surface position information about the surface of the object is detected on the basis of the detection by said light receiving element; conveying means for moving the object in a direction approximately along the surface of the object; and a variable pattern generator for projecting an arbitrary pattern image on the surface of the object, wherein said variable pattern generator projects an arbitrary pattern in accordance with the conveyance through said conveying means. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29, 30, 31)
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32. An exposure apparatus for projecting a circuit pattern of a reticle onto a photosensitive substrate, said apparatus comprising:
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a projection optical system for performing the projection exposure; conveying means for moving the photosensitive substrate in a direction orthogonal to an optical axis of said projection optical system; surface position information detecting means for detecting positional information about the surface of the photosensitive substrate, said surface position information detecting means comprising (i) a variable pattern generator for projecting an arbitrary pattern image on the photosensitive substrate, said variable pattern generator projecting an arbitrary pattern image in accordance with the conveyance through said conveying means, (ii) a light projecting optical system for projecting light to the surface of the photosensitive substrate in a direction inclined with respect to the optical axis of said projection optical system, wherein the pattern image is formed on the photosensitive substrate surface through the projection, (iii) a light receiving optical system for directing light from the pattern image, and (iv) a light receiving element for detecting the light directed by said light receiving optical system, wherein surface position information about the surface of the object is detected on the basis of the detection by said light receiving element; and a control system for controlling a position of the photosensitive substrate with respect to the optical axis of said projection optical system, in accordance with the detection by said surface position detecting means. - View Dependent Claims (33, 34, 35, 36, 37, 38, 39, 40, 41)
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42. An electronic device manufacturing method, comprising the steps of:
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conveying a photosensitive substrate in a direction perpendicular to an optical axis of a projection optical system; providing a variable pattern generator for projecting an arbitrary pattern image on the photosensitive substrate, wherein the variable pattern generator projects an arbitrary pattern image in accordance with the conveyance; projecting light onto the surface of the photosensitive substrate in a direction inclined with respect to the optical axis of the projection optical system, whereby the pattern image is formed on the photosensitive substrate; directing light from the pattern image to a light receiving element; detecting the directed light, with the light receiving element; controlling the position of the photosensitive substrate with respect to an optical axis direction of the projection optical system, on the basis of the detection; exposing the position controlled photosensitive substrate to a circuit pattern through the projection optical system; developing the exposed photosensitive substrate; and forming a circuit on the developed substrate, whereby a device is produced.
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Specification