Anti-solar and low emissivity functioning multi-layer coatings on transparent substrates
First Claim
1. A coated article of manufacture comprising a substantially transparent substrate with a substantially transparent coating on a surface of the substrate, the substantially transparent coating comprising:
- a first anti-reflection layer of dielectric material,an infra-red reflective layer of silver metal overlying the anti-reflection dielectric layer,a buffer layer selected from silica, silicon, silicon nitride and tungsten nitride materials, directly overlying the infra-red reflective layer of silver metal, anda second anti-reflection layer of tungsten oxide overlying the buffer layer.
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Accused Products
Abstract
A coated article of manufacture comprises a substantially transparent substrate with a substantially transparent dual-function coating on a surface of the substrate. The coating provides low emissivity and high anti-solar performance properties. It comprises a first anti-reflection layer of dielectric material, preferably tungsten oxide. An infra-red reflective layer of silver metal overlies the anti-reflection dielectric layer. Optionally, a buffer layer is positioned between the anti-reflection layer and the infra-red reflective layer. Also, optionally, a color control layer may be positioned between the anti-reflection layer and the substrate. A silicon buffer layer, directly overlies the infra-red reflective layer of silver metal. A second anti-reflection layer of tungsten oxide overlies the buffer layer. In accordance with a method of manufacturing the coated article, each of the layers of the dual-function coating are deposited in turn by cathodic sputtering in a multi-station sputtering chamber. Passing the transparent substrate through the sputtering chamber a second time to produce a double-layer coating structure is found to provide especially high quality performance characteristics.
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Citations
40 Claims
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1. A coated article of manufacture comprising a substantially transparent substrate with a substantially transparent coating on a surface of the substrate, the substantially transparent coating comprising:
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a first anti-reflection layer of dielectric material, an infra-red reflective layer of silver metal overlying the anti-reflection dielectric layer, a buffer layer selected from silica, silicon, silicon nitride and tungsten nitride materials, directly overlying the infra-red reflective layer of silver metal, and a second anti-reflection layer of tungsten oxide overlying the buffer layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 32)
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18. A coated article of manufacture comprising a substantially transparent substrate with a substantially transparent coating on a surface of the substrate, the substantially transparent coating comprising:
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a first anti-reflection layer of dielectric material, an infra-red reflective layer of silver metal overlying the anti-reflection dielectric layer, a buffer layer directly overlying the infra-red reflective layer of silver metal, and a second anti-reflection layer of tungsten oxide overlying the buffer layer wherein the first anti-reflection layer of dielectric material is tungsten oxide. the first anti-reflection layer of tungsten oxide and the second anti-reflection layer of tungsten oxide each has a substantially uniform thickness from 300Å
to 450Å
, andthe thickness of the first anti-reflection layer of tungsten oxide is from 6% to 12% less than the thickness of the second anti-reflection layer of tungsten oxide.
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19. A coated article of manufacture comprising a substantially transparent substrate with a substantially transparent coating on a surface of the substrate, the substantially transparent coating comprising:
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a first anti-reflection layer of dielectric material, an infra-red reflective layer of silver metal overlying the anti-reflection dielectric layer, a buffer layer directly overlying the infra-red reflective layer of silver metal and a second anti-reflection layer of tungsten oxide overlying the buffer layer, wherein the first anti-reflection layer is WOx, where x is from 2.5 to 2.99 and the second anti-reflection layer is WO3.
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20. A coated article of manufacture comprising a substantially transparent substrate with a substantially transparent coating on a surface of the substrate, the substantially transparent coating comprising:
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a first anti-reflection layer of dielectric material, an infra-red reflective layer of silver metal overlying the anti-reflection dielectric layer, a buffer layer directly overlying the infra-red reflective layer of silver metal, and a second anti-reflection layer of tungsten oxide overlying the buffer layer, wherein the first anti-reflection layer is WOx and the second anti-reflection layer is WOx, where x is independently in each instance from 2.5 to 2.99.
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21. A coated article of manufacture comprising a substantially transparent substrate with a substantially transparent coating on a surface of the substrate, the substantially transparent coating comprising:
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a first anti-reflection layer of dielectric material, an infra-red reflective layer of silver metal overlying the anti-reflection dielectric layer, a buffer layer directly overlying the infra-red reflective layer of silver metal, and a second anti-reflection layer of tungsten oxide overlying the buffer layer wherein the first anti-reflection layer is WO3 and the second anti-reflection layer is WOx, where x is from 2.5 to 2.99.
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22. A coated article of manufacture comprising a substantially transparent substrate with a substantially transparent coating on a surface of the substrate, the substantially transparent coating comprising:
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a first anti-reflection layer of dielectric material, an infra-red reflective layer of silver metal overlying the anti-reflection dielectric layer, a buffer layer directly overlying the infra-red reflective layer of silver metal, and a second anti-reflection layer of tungsten oxide overlying the buffer layer, and inner buffer layer positioned between the first anti-reflection layer and the infra-red reflective layer of silver metal. - View Dependent Claims (23)
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24. A coated article of manufacture comprising a substantially transparent substrate with a substantially transparent coating on a surface of the substrate the substantially transparent coating comprising:
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a first anti-reflection layer of dielectric material, an infra-red reflective layer of silver metal overlying the anti-reflection dielectric layer, a buffer layer directly overlying the infra-red reflective layer of silver metal, and a second anti-reflection layer of tungsten oxide overlying the buffer layer, a second infra-red reflective layer of silver metal overlying the second anti-reflection layer of tungsten oxide, a second buffer layer directly overlying the second infra-red reflective layer of silver metal, and a third anti-reflection layer of tungsten oxide overlying the second buffer layer.
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25. A glazing unit having normal emissivity not greater than 0.01 and comprising a substantially transparent substrate with a substantially transparent coating on a surface of the substrate, the substantially transparent coating comprising:
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a first anti-reflection layer of dielectric material, an infra-red reflective layer of silver metal overlying the anti-reflection dielectric layer, a buffer layer directly overlying the infra-red reflective layer of silver metal, and a second anti-reflection layer of tungsten oxide overlying the buffer layer.
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26. An electrically conductive panel comprising a substantially transparent substrate with a substantially transparent coating on a surface of the substrate, the substantially transparent coating comprising:
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a first anti-reflection layer of dielectric material, an infra-red reflective layer of silver metal overlying the anti-reflection dielectric layer, a buffer layer directly overlying the infra-red reflective layer of silver metal, wherein the buffer layer comprises material selected from silica, silicon, silicon nitride and tungsten nitride materials, and a second anti-reflection layer of tungsten oxide overlying the buffer layer.
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27. A method of manufacturing a coated article comprising:
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providing a substantially transparent substrate; and forming a substantially transparent coating on a surface of the substrate by; A) depositing a first anti-reflection layer of dielectric material, B) subsequently depositing silver metal over the anti-reflection dielectric layer to form an anti-reflection layer, C) subsequently depositing a buffer layer directly onto the infra-red reflective layer, wherein the buffer layer comprises material selected from silica, silicon, silicon nitride and tungsten nitride materials, and D) subsequently depositing tungsten oxide over the buffer layer to form a second anti-reflection layer. - View Dependent Claims (28, 29, 30, 36)
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31. A method of manufacturing a coated article comprising:
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providing a substantially transparent substrate; and forming a substantially transparent coating on a surface of the substrate by; A) depositing a first anti-reflection layer of dielectric material, B) subsequently depositing silver metal over the anti-reflection dielectric layer to form an anti-reflection layer, C) subsequently depositing a buffer layer directly onto the infra-red reflective layer, and D) subsequently depositing tungsten oxide over the buffer layer to form a second anti-reflection layer, wherein the step of depositing the buffer layer comprises sputtering silicon from a doped silicon target in a non-reactive atmosphere directly onto the infra-red reflective layer.
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33. A method of manufacturing a coated article comprising:
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providing a substantially transparent substrate; and forming a substantially transparent coating on a surface of the substrate by; A) depositing a first anti-reflection layer of dielectric material, B) subsequently depositing silver metal over the anti-reflection dielectric layer to form an anti-reflection layer, C) subsequently depositing a buffer layer directly onto the infra-red reflective layer, and D) subsequently depositing tungsten oxide over the buffer layer to form a second anti-reflection layer, and further comprising, between step (A) and step (B), the step of depositing an inner buffer layer over the first anti-reflection layer.
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34. A method of manufacturing a coated article comprising:
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providing a substantially transparent substrate; and forming a substantially transparent coating on a surface of the substrate by; A) depositing a first anti-reflection layer of dielectric material, B) subsequently depositing silver metal over the anti-reflection dielectric layer to form an anti-reflection layer, C) subsequently depositing a buffer layer directly onto the infra-red reflective layer, and D) subsequently depositing tungsten oxide over the buffer layer to form a second anti-reflection layer, and further comprising, prior to step (A), the step of depositing a color control layer over the surface of the substrate. - View Dependent Claims (35)
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37. A method of manufacturing a coated article comprising:
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providing a substantially transparent substrate; and forming a substantially transparent coating on a surface of the substrate by; A) depositing a first anti-reflection layer of dielectric material, B) subsequently depositing silver metal over the anti-reflection dielectric layer to form an anti-reflection layer, C) subsequently depositing a buffer layer directly onto the infra-red reflective layer, and D) subsequently depositing tungsten oxide over the buffer layer to form a second anti-reflection layer, and further comprising, subsequent to step (D), the steps of; depositing tungsten oxide onto the second anti-reflection layer; subsequently depositing silver metal to form a second infra-red reflective layer;
subsequently depositing a second buffer layer directly overlying the second infra-red reflective layer; andsubsequently depositing a third anti-reflection layer of tungsten oxide over the second buffer layer.
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38. A method of manufacturing a coated article comprising the steps of:
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providing a substantially transparent substrate; and forming a substantially transparent coating on a surface of the substrate by passing the substrate through a multi-station sputtering chamber, with continuous travel of the substrate through the chamber from station to station, including; A) depositing a first anti-reflection-layer of tungsten oxide directly onto the surface of the substrate by sputtering tungsten metal in an atmosphere comprising oxygen at a first station of the multi-station chamber; B) subsequently depositing silver metal over the anti-reflection dielectric layer to form an anti-reflection layer by sputtering silver metal in a substantially inert atmosphere at a subsequent station of the multi-station chamber; C) subsequently depositing-a buffer layer directly onto the infra-red reflective layer by sputtering silicon in a substantially inert atmosphere at a subsequent station of the multi-station chamber; and D) subsequently depositing tungsten oxide over the buffer layer to form a second anti-reflection layer by sputtering tungsten metal in an atmosphere comprising oxygen at a subsequent station of the multi-station chamber. - View Dependent Claims (39, 40)
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Specification