Multi-step polysilicon deposition process for boron penetration inhibition
First Claim
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1. A semiconductor device comprising:
- a substrate;
a first layer of polysilicon over the substrate, wherein the first layer has a thickness of approximately 20 to 500 angstroms;
an interface layer over the first layer of polysilicon, wherein the interface layer impedes diffusion of doping material, wherein the interface layer is formed by exposing the first layer of polysilicon to an oxidation ambient; and
a second layer of polysilicon over the interface layer, wherein the second layer of polysilicon is deposited separately in time from the first layer of polysilicon.
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Abstract
The present invention provides an improved semiconductor device and method of impeding the diffusion of boron by providing at least one layer of polysilicon and an interface substance. A semiconductor device according to the present invention is comprised of a substrate; gate oxide coupled to the substrate; a layer of polysilicon coupled to the gate oxide; and an interface layer between the layer of polysilicon and the gate oxide, wherein the interface layer impedes diffusion of doping material.
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23 Claims
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1. A semiconductor device comprising:
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a substrate; a first layer of polysilicon over the substrate, wherein the first layer has a thickness of approximately 20 to 500 angstroms; an interface layer over the first layer of polysilicon, wherein the interface layer impedes diffusion of doping material, wherein the interface layer is formed by exposing the first layer of polysilicon to an oxidation ambient; and a second layer of polysilicon over the interface layer, wherein the second layer of polysilicon is deposited separately in time from the first layer of polysilicon. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method for manufacturing semiconductors comprising the steps of:
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a) providing a substrate; b) providing a first layer of polysilicon over the substrate, wherein the first layer of polysilicon has a thickness of approximately 20 to 500 angstroms; c) providing an interface layer over the first layer of polysilicon by exposing the first layer of polysilicon to an oxidation ambient; and d) providing a second layer of polysilicon over the interface layer, wherein the second layer of polysilicon is deposited separately in time from the first layer of polysilicon. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A method of manufacturing semiconductors comprising:
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a) providing a substrate; b) depositing a first layer of polysilicon through a deposition stream over the substrate, wherein the first layer polysilicon has a thickness of approximately 20 to 500 angstroms; c) forming an interface material by introducing an oxidation ambient into the deposition stream over the first layer of polysilicon; and d) providing a second layer of polysilicon over the first layer of polysilicon and interface material, wherein the second layer of polysilicon is deposited separately in time from the first layer of polysilicon. - View Dependent Claims (20, 21, 22, 23)
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Specification