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Apparatus for exciting a plasma in a semiconductor wafer processing system using a complex RF waveform

  • US 6,043,607 A
  • Filed: 12/16/1997
  • Issued: 03/28/2000
  • Est. Priority Date: 12/16/1997
  • Status: Expired due to Fees
First Claim
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1. Apparatus for exciting a plasma within a semiconductor wafer processing system, comprising:

  • a complex waveform generator for generating a complex waveform;

    a power amplifier, coupled to said complex waveform generator, for amplifying said complex waveform; and

    a matching network, coupled to the power amplifier, for matching the impedance of the power amplifier to the impedance of plasma excitation circuitry within said semiconductor wafer processing system.

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