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Plasma processing apparatus

  • US 6,043,608 A
  • Filed: 10/31/1997
  • Issued: 03/28/2000
  • Est. Priority Date: 10/31/1996
  • Status: Expired due to Term
First Claim
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1. Plasma processing apparatus for carrying out a process onto a substrate utilizing a plasma generated by supplying RF energy with a plasma generation gas from an antenna, wherein said antenna has multiple antenna elements provided symmetrically to the center on the axis of said substrate and an end shorting member shorting said antenna elements at those ends further from RF supply points on said antenna elements so that an RF current path symmetrical to said center is applied interconnecting said ends of neighboring two of said antenna elements.

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