Waveguide pair with cladding

• US 6,044,192 A
• Filed: 04/12/1999
• Issued: 03/28/2000
• Est. Priority Date: 01/09/1996
• Status: Expired due to Fees

• Current Assignee: Nortel Networks UK Limited (Nortel Networks Corporation)
• Original Assignee: Nortel Networks Corporation
• Inventors: Day, Stephen, Grant, Michael Francis
• Primary Examiner(s): Healy, Brian
• Application Number:
  US09/091,257
• Time in Patent Office: 351 Days
• Field of Search: 385/14, 385/15, 385/41, 385/42, 385/129, 385/130, 385/131, 385/132, 385/141, 65/385, 65/386, 65/391
• US Class Current: 385/129
• CPC Class Codes: G02B 2006/12147 Coupler
• CPC Class Codes: G02B 2006/12169 Annealing
• CPC Class Codes: G02B 6/125 Bends, branchings or intersections
• CPC Class Codes: G02B 6/13 Integrated optical circuits characterised by the manufacturing method
• CPC Class Codes: G02B 6/132 by deposition of thin films

Abstract

A planar waveguide structure has, supported on a lower refractive index buffer layer (5), a pair of optical cores (1, 2) that, over at least a portion of their length, are closely spaced. These cores are covered with a layer (6) of cladding material comprising boron and phosphorus doped silica glass deposited by PECVD as a succession of individually annealed layers in order to minimize the incidence of voids in the deposit between the cores.

Claims

1. A cladded waveguide pair assembly obtainable by plasma enhanced chemical vapour deposition (PECVD), comprising a substrate, a buffer layer of dielectric material on said substrate, a pair of elongate dielectric waveguide cores deposited on the buffer layer and of higher refractive index than that of the buffer layer, and a cladding layer of boron and phosphorus doped silica glass (BPSG) arranged over the pair of cores and adjoining regions of the buffer layer including the interval between the cores of the pair, said BPSG cladding layer having a lower refractive index than that of the material of the cores and a lower flowing temperature than that of the materials of the cores and the buffer, wherein said BPSG cladding layer is obtainable in multiple stages each stage consisting of a PECVD deposition step and a subsequent annealing step by which the deposited material is flowed.

2. A cladded waveguide pair assembly according to claim 1 in which the BPSG cladding layer has a refractive index close to that of the buffer.

3. A cladded waveguide pair assembly according to claim 2 in which the BPSG includes silica glass containing 2.4 weight % phosphorus and 3.4 weight % boron.

4. A cladded waveguide pair assembly according to claim 1 wherein the buffer is pure silica.

5. A cladded waveguide pair assembly according to claim 4 in which the BPSG cladding layer has a refractive index close to that of the buffer.

6. A cladded waveguide pair assembly according to claim 5 in which the BPSG includes silica glass containing 2.4 weight % phosphorus and 3.4 weight % boron.

7. A method of producing a cladded waveguide pair assembly by plasma enhanced chemical vapour deposition (PECVD), comprising depositing a buffer layer of dielectric material on a substrate (4), depositing a pair of spaced dielectric waveguide cores on the buffer layer, which cores are of a material of higher refractive index than that of the buffer layer, and producing a layer of cladding over the pair of cores and adjoining region of the buffer layer including the interval between the cores of the pair, the material of said cladding layer having a lower refractive index than that of the material of the cores and a lower flowing temperature than that of the materials of the cores and buffer, wherein said cladding layer is produced in multiple stages, each stage including a PECVD deposition step followed by a step of annealing in which the deposited material is flowed.

8. A method according to claim 7 wherein the annealing step of each deposition stage of the production of the cladding layer includes flowing at 1000°

C. for one hour.

9. A method according to claim 7, wherein the deposition step of each deposition stage of the production of the cladding layer comprises PECVD deposition of BPSG silica glass consisting of 2.4 weight % phosphorus and 3.4 weight % boron.

10. A method according to claim 8, wherein the deposition step of each deposition stage of the production of the cladding layer comprises PECVD deposition of BPSG silica glass consisting of 2.4 weight % phosphorus and 3.4 weight % boron.