Differential interferometer system and lithographic step-and-scan apparatus provided with such a system

• US 6,046,792 A
• Filed: 03/06/1997
• Issued: 04/04/2000
• Est. Priority Date: 03/06/1996
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: US Philips Corporation (Koninklijke Philips N.V.)
• Inventors: Van Der Werf, Jan E., Dirksen, Peter
• Primary Examiner(s): Metjahic, Safet
• Assistant Examiner(s): THOMPSON, TIMOTHY J
• Application Number:
  US08/812,283
• Time in Patent Office: 1,125 Days
• Field of Search: 355/53, 355/51, 355/67, 356/358, 356/363, 356/344, 356/401, 356/400
• US Class Current: 355/53
• CPC Class Codes: G01B 2290/15 Cat eye, i.e. reflection always parallel to incoming beam
• CPC Class Codes: G01B 2290/70 Using polarization in the interferometer
• CPC Class Codes: G01B 9/02007 Two or more frequencies or sources used for interferometric measurement using only beat G01B9/02003
• CPC Class Codes: G01B 9/02018 Multipass interferometers, e.g. double-pass
• CPC Class Codes: G01B 9/02019 contacting different points on same face of object
• CPC Class Codes: G01B 9/02021 contacting different faces of object, e.g. opposite faces
• CPC Class Codes: G01B 9/02027 Two or more interferometric channels or interferometers
• CPC Class Codes: G03F 7/70358 Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position

Abstract

A differential interferometer system for measuring the mutual positions and movements of a first object (WH) and a second object (MH). The system comprises a first interferometer unit (1, 2, 3, 4) having a first measuring reflector (RW) and a second interferometer unit (5, 6, 7, 8) having a second measuring reflector (RM). Since a measuring beam (b_m) passes through both the first and the second interferometer unit and is reflected by both the first and the second measuring reflector, and since the measuring beam and the reference beam (b_r) traverse the same path at least between the two interferometer units, accurate measurements can be preformed very rapidly. The interferometer system may be used to great advantage in a step-and-scan-lithographic projection apparatus.

Claims

1. An interferometer system for measuring a mutual position and movement of a first and a second object in at least one direction, said system comprising, for at least one of all possible mutual directions of movement:

a first interferometer unit, associated with the first object, provided with a first beam splitter, a first measuring reflector and a plurality of first reflectors, and

a second interferometer unit, associated with the second object, provided with a second beam splitter, a second measuring reflector and a plurality of second reflectors, characterized in that, in operation, a measuring beam passes through both the first and the second interferometer unit and is reflected at least once by both the first measuring reflector and the second measuring reflector, in that the first and second interferometer units have the same radiation-sensitive detector, and in that a reference beam associated with the measuring beam traverses the same path as the measuring beam between the first and the second interferometer unit.

2. An interferometer system as claimed in claim 1, for measuring the mutual positions of a first object, moving at a speed v, and a second object, moving at a speed n.v, in which n is an integer, characterized in that the ratio between the number of times the measuring beam is reflected by the measuring reflector associated with the first object and the number of times the measuring beam is reflected by the measuring reflector associated with the second object is equal to n.

3. An interferometer system as claimed in claim 1, characterized in that, for the purpose of eliminating the influence of a rotation or tilt of the first object on the interferometer signal, the second interferometer unit is adapted in such a way that the measuring beam coming from the first interferometer unit is reflected m+1 times in the second interferometer unit before returning to the first interferometer unit, m being an even number which is larger than 2.

4. An apparatus for multi-imaging a mask pattern on a substrate in accordance with a step-and-scan principle, which apparatus comprises a mask holder arranged in a mask table, a substrate holder arranged in a substrate table, and a projection system arranged between the mask table and the substrate table, characterized by an interferometer system as claimed in claim 1, for measuring the mutual position of the mask and the substrate constituting the first and the second object.

5. An apparatus as claimed in claim 4, in which the mask pattern is imaged on the substrate with a magnification M, characterized in that the ratio between the number of times the measuring beam is reflected by the measuring reflector associated with the substrate and the number of times the measuring beam is reflected by the measuring reflector associated with a mask is equal to 1/M.

6. An apparatus as claimed in claim 4, characterized in that a measuring reflector associated with the substrate and a measuring reflector associated with the mask are constituted by a reflecting side face of the substrate holder and the mask holder, respectively.

7. An apparatus as claimed in claim 4, characterized in that the interferometer system comprises a projection system interferometer unit for measuring the position of the projection system at one location, and in that the projection system is provided with an extra measuring reflector at said location.

8. An apparatus as claimed in claim 7, characterized in that the projection system interferometer unit is traversed by said reference beam.

9. An apparatus as claimed in claim 4, characterized in that the projection system is provided with two further measuring reflectors at locations proximate to the mask holder and proximate to the substrate holder, respectively, and in that said reference beam is reflected by both measuring reflectors.

10. An interferometer system as claimed in claim 2, characterized in that, for the purpose of eliminating the influence of a rotation or tilt of the first object on the interferometer signal, the second interferometer unit is adapted in such a way that the measuring beam coming from the first interferometer unit is reflected m+1 times in the second interferometer unit before returning to the first interferometer unit, m being an even number which is larger than 2.

11. An apparatus for multi-imaging a mask pattern on a substrate in accordance with the step-and-scan principle, which apparatus comprises a mask holder arranged in a mask table, a substrate holder arranged in a substrate table, and a projection system arranged between the mask table and the substrate table, characterized by an interferometer system as claimed in claim 2, for measuring the mutual position of the mask and the substrate constituting the first and the second object.

12. An apparatus as claimed in claim 5, characterized in that a measuring reflector associated with the substrate and a measuring reflector associated with the mask are constituted by a reflecting side face of the substrate holder and the mask holder, respectively.

13. An apparatus as claimed in claim 5, characterized in that the interferometer system comprises a projection system interferometer unit for measuring the position of the projection system at one location, and in that the projection system is provided with an extra measuring reflector at said location.

14. An apparatus as claimed in claim 6, characterized in that the interferometer system comprises a projection system interferometer unit for measuring the position of the projection system at one location, and in that the projection system is provided with an extra measuring reflector at said location.