Illumination apparatus, a projection exposure apparatus having the same, a method of manufacturing a device using the same, and a method of manufacturing the projection exposure apparatus
First Claim
1. An illumination apparatus, comprisinga light source system for providing a light beam along a preselected path;
- an optical integrator, placed in said path of said light beam to form a plurality of light sources therefrom;
a condenser optical system, placed in the path of light beams that have passed through said plurality of light sources, said condenser optical system guiding light from said optical integrator to an illuminated surface; and
a filter, placed in a location that is in an optically conjugate relationship to said illuminated surface, said filter having at least a first area corresponding to a first portion of said plurality of light sources, and a second area corresponding to a second portion of said plurality of light sources other than said first portion;
wherein,said filter has at least one first filter element having a first transmissivity distribution provided over the entirety of said first area of said filter; and
hasat least one second filter element having a second transmissivity distribution that is the inverse of said first transmissivity distribution provided over the entirety of said second area of said filter.
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Accused Products
Abstract
An illumination apparatus is provided capable of obtaining identical line widths at all positions in an image surface. A projection exposure apparatus using this illumination apparatus is also provided as well as a method of manufacturing the projection exposure apparatus and a method of manufacturing a device using this apparatus. The illumination apparatus includes a light source system for supplying a light beam, an optical integrator for forming a plurality of light sources based on a light beam from the light source and a condenser optical system for converging beams from the plurality of light sources for illuminating an illuminated surface. The apparatus also has a filter placed in a location that is in an optically conjugate relationship to the illuminated surface. The filter has at least a first area corresponding to a first portion of the plurality of light sources, and a second area corresponding to a second portion of the plurality of light sources other than the first portion. The filter has at least one first filter element having a first transmissivity distribution provided over the entirety of the first area of the filter. The filter also has at least one second filter element having a second transmissivity distribution that is the inverse of the first transmissivity distribution provided over the entirety of the second area of the filter.
57 Citations
40 Claims
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1. An illumination apparatus, comprising
a light source system for providing a light beam along a preselected path; -
an optical integrator, placed in said path of said light beam to form a plurality of light sources therefrom; a condenser optical system, placed in the path of light beams that have passed through said plurality of light sources, said condenser optical system guiding light from said optical integrator to an illuminated surface; and a filter, placed in a location that is in an optically conjugate relationship to said illuminated surface, said filter having at least a first area corresponding to a first portion of said plurality of light sources, and a second area corresponding to a second portion of said plurality of light sources other than said first portion;
wherein,said filter has at least one first filter element having a first transmissivity distribution provided over the entirety of said first area of said filter; and
hasat least one second filter element having a second transmissivity distribution that is the inverse of said first transmissivity distribution provided over the entirety of said second area of said filter. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. An illumination apparatus comprising
a light source system for supplying a light beam; -
an optical integrator for forming a plurality of light sources based on said light beam from said light source; a condenser optical system for converging beams from said plurality of light sources for illuminating an illuminated surface, said illuminated surface constituting a plurality of microsurfaces; a filter placed in a location that is in an optically conjugate relationship to said illuminated surface, said filter having at least a first area corresponding to a first portion of said plurality of light sources, and a second area corresponding to a second portion of said plurality of light sources other than said first portion;
wherein,said filter has at least one first filter element having a first transmissivity distribution provided over the entirety of said first area of said filter; and has at least one second filter element having a second transmissivity distribution provided over the entirety of said second area of said filter; and said first and second filter elements transform the light intensity distribution in the Fourier transform planes of said microsurfaces to a prescribed light intensity distribution, independently for light converging at prescribed points on said illuminated surface, while maintaining the relative illuminance distributed over said illuminated surface. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36)
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37. An illumination apparatus, comprising
a light source system; -
an optical integrator, positioned so as to be able to receive a light beam from said light source system, for forming a plurality of light sources based on said light beam; a condenser optical system, positioned so as to be able to receive light beams that have passed through said plurality of light sources, for converging light beams from said plurality of light sources, for illuminating an illuminated surface; a first filter, placed in a location that is in an optically conjugate relationship to said illuminated surface, said first filter having a transmissivity distribution such as to transform the light intensity distribution in the Fourier transform planes of microsurfaces constituting said illuminated surface, independently, for light converging at prescribed points on said illuminated surface, to prescribed light intensity distributions; and a second filter, placed in a location that is in an optically conjugate relationship to said illuminated surface, said second filter having transmissivity distribution for correcting at least nonuniformity of relative illumination distributed over said illuminated surface caused by the transmissivity distribution of said first filter. - View Dependent Claims (38)
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39. A method of manufacturing a projection exposure apparatus for projecting, onto a substrate, a prescribed pattern formed on a mask or reticle, comprising the following steps:
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a first step of guiding a light beam from a light source through an optical integrator for forming a plurality of light sources based on said light beam, a condenser optical system for converging light from said optical integrator, for illuminating said mask or reticle, a projection optical system for forming, on a prescribed image surface, an image of said pattern on said mask or reticle, and onto an image surface of said projection optical system; a second step of measuring the relative illuminance distributed on said image surface, and measuring, in the Fourier transform planes of the microsurfaces that constitute said image surface, the light intensity distributions for light converging at at least two points on said image surface; a third step of placing in a location that is in an optically conjugate relationship to said image surface, a filter having at least a first area corresponding to a first portion of said plurality of light sources, and a second area corresponding to a second portion of said plurality of light sources other than said first portion; and a fourth step of providing, over the entirety of said first area of said filter, at least one first filter element having a first transmissivity distribution, while also providing, over the entirety of said second area of said filter, at least one second filter element having a second transmissivity distribution; wherein, in said fourth step, said first and second transmissivity distributions are set so as to maintain said relative illuminations distributed in said image surface substantially uniform, while transforming said light intensity distributions, independently, to prescribed light intensity distributions.
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40. A method of manufacturing a projection exposure apparatus for projecting, onto a substrate, a prescribed pattern formed on a mask or reticle, comprising the following steps:
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a first step of simulating the guiding of a light beam from a light source through an optical integrator for forming a plurality of light sources based on said light beam, a condenser optical system for converging light from said optical integrator, for illuminating said mask or reticle, a projection optical system for forming, on a prescribed image surface, an image of said pattern on said mask or reticle, and onto the image surface of said projection optical system; a second step of computing the relative illuminations distributed in said image surface, and computing the light intensity distribution in the Fourier transform planes of the microsurfaces that constitute said image surface, for light converging at at least two points on said image surface, based on the results obtained in said simulation of said first step; a third step of setting in a location that is in an optically conjugate relationship to said image surface, a filter having at least a first area corresponding to a first portion of said plurality of light sources, and a second area corresponding to a second portion of said plurality of light sources other than said first portion; and a fourth step of setting, over the entirety of said first area of said filter, at least one first filter element having a first transmissivity distribution, while also setting, over the entirety of said second area of said filter, at least one second filter element having a second transmissivity distribution; wherein, in said fourth step, said first and second transmissivity distributions are set so as to maintain said relative illuminations distributed in said image surface substantially uniform, while transforming said light intensity distributions, independently, to prescribed light intensity distributions.
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Specification