Manufacture method for micromechanical devices

• US 6,053,617 A
• Filed: 09/23/1994
• Issued: 04/25/2000
• Est. Priority Date: 09/23/1994
• Status: Expired due to Term

• Current Assignee: Texas Instruments, Inc.
• Original Assignee: Texas Instruments, Inc.
• Inventors: Kaeriyama, Toshiyuki
• Primary Examiner(s): Spyrou, Cassandra
• Assistant Examiner(s): SIKDER, MOHAMMAD YUNUS
• Application Number:
  US08/311,480
• Time in Patent Office: 2,041 Days
• Field of Search: 359/871, 359/872, 359/291, 359/295, 359/224, 216/2, 216/49, 216/58, 216/83, 156/653, 156/654, 156/655, 156/656
• US Class Current: 359/872
• CPC Class Codes: G02B 26/0841 the reflecting element being moved or deformed by electrostatic means

Abstract

A process for manufacturing micromechanical devices. The process includes the step of covering the activation circuitry (201) and those parts of the device that come in contact with moving parts with a pad film (202). The pad film prevents frictional wear and sticking of the moving parts, and can prevent electrical shorts between different parts of the activation circuitry. Additionally, the pad film can prevent particulates from interfering with the operation of the device.

Claims

1. A method for forming a micromechanical device wherein said method includes the step of forming an inorganic pad film over activation circuitry having a first bias and any moving parts of the device having a second bias, which contact other surfaces subjecting said parts to sticking or friction, wherein said pad film acts as an insulator between said activation circuitry and said moving parts.

2. The method of claim 1 wherein said inorganic material is a nitride.

3. The method of claim 1 wherein said inorganic material is an oxide.

4. The method of claim 1 wherein said micromechanical device is a digital micromirror device.