Cryogenic annealing of sputtering targets
First Claim
1. A method for cryogenically annealing a sputtering target to provide a uniformly dense molecular target structure comprisingplacing a sputtering target having internal and external stresses in a temperature-controlled cryogenic chamber,cooling said chamber with a liquified gas from an ambient temperature to a cryogenic temperature at a controlled rate to cool the target and avoid target fracture,maintaining the target at said cryogenic temperature for a period of time sufficient to cryogenically anneal the target, whereby said internal and external stresses are relieved and a uniformly dense molecular target structure is provided, andreturning the target structure to ambient or elevated temperature.
4 Assignments
0 Petitions
Accused Products
Abstract
Sputtering targets are cryogenically annealed to provide a uniformly dense molecular structure by placing the target in a temperature-controlled cryogenic chamber and cooling the chamber to a cryogenic temperature at a controlled rate. The target is maintained at a cryogenic temperature to cryogenically anneal the target and the target is subsequently returned to ambient or elevated temperature. Improvements in sputtered particle performance and early life film uniformity are achieved with the cryo-annealed targets.
81 Citations
16 Claims
-
1. A method for cryogenically annealing a sputtering target to provide a uniformly dense molecular target structure comprising
placing a sputtering target having internal and external stresses in a temperature-controlled cryogenic chamber, cooling said chamber with a liquified gas from an ambient temperature to a cryogenic temperature at a controlled rate to cool the target and avoid target fracture, maintaining the target at said cryogenic temperature for a period of time sufficient to cryogenically anneal the target, whereby said internal and external stresses are relieved and a uniformly dense molecular target structure is provided, and returning the target structure to ambient or elevated temperature.
-
14. A method for cryogenically annealing a sputtering target to provide a uniformly dense molecular target structure for improved sputtered particle performance and uniformity comprising
placing a sputtering target having internal and external stresses in a temperature-controlled cryogenic chamber, cooling said chamber from an ambient temperature with liquid nitrogen to a cryogenic temperature of approximately -185° - C. at a computer-controlled rate to cool the target and to avoid target fracture,
maintaining the target at approximately -185°
C. for a period of time sufficient to cryogenically anneal the target, whereby said internal and external stresses are relieved and a uniformly dense molecular target structure is provided.returning said target structure at a computer-controlled rate to an elevated temperature, and removing said target from said chamber. - View Dependent Claims (15, 16)
- C. at a computer-controlled rate to cool the target and to avoid target fracture,
Specification