Light exposing device for manufacturing semiconductor device which further removes asymmetrical aberration
First Claim
Patent Images
1. A light-exposing device for making a semiconductor device, comprising:
- a reticle having patterns to be exposed to light;
a blind for controlling a light-exposing area of the reticle;
a condenser lens for condensing light from a light source; and
an optical system, placed between the blind and the reticle, comprising correction means for imaging the blind on the reticle in equi-magnification and for generating symmetrical aberrations within a predetermined range over the entire reticle.
1 Assignment
0 Petitions
Accused Products
Abstract
A light-exposing device for making a semiconductor device. A reticle has patterns to be exposed to light. A blind controls a light-exposing area of the reticle. An optical system between the blind and the reticle condenses light passing through the blind. Adjacent patterns on a reticle are consecutively projected by superimposing light-exposing energy. An extra optical system condenses light passing through the blind. The usable area of the reticle is maximized; the interval between patterns is not critical; and inferiority by either lack or excess of the exposure to light between the patterns is reduced.
-
Citations
7 Claims
-
1. A light-exposing device for making a semiconductor device, comprising:
-
a reticle having patterns to be exposed to light; a blind for controlling a light-exposing area of the reticle; a condenser lens for condensing light from a light source; and an optical system, placed between the blind and the reticle, comprising correction means for imaging the blind on the reticle in equi-magnification and for generating symmetrical aberrations within a predetermined range over the entire reticle. - View Dependent Claims (2, 3, 4)
-
-
5. A light-exposing device for manufacturing a semiconductor device, comprising:
-
a light source for producing a dot of light; a reflector for diffusing the dot of light into a surface of light; a condenser lens for condensing light from the reflector; a reticle having a plurality of patterns; a blind for controlling a light-exposing area of the reticle; a projection lens for projecting a pattern of the reticle; and correction means, placed between the blind and the reticle, for imaging the blind on the reticle in equi-magnification and for generating symmetrical aberrations within a predetermined range over the entire reticle. - View Dependent Claims (6, 7)
-
Specification