Light exposing device for manufacturing semiconductor device which further removes asymmetrical aberration

• US 6,067,145 A
• Filed: 03/06/1996
• Issued: 05/23/2000
• Est. Priority Date: 03/28/1995
• Status: Expired due to Fees

• Current Assignee: Samsung Aerospace Industries, Ltd. (Korea Aerospace Industries Limited)
• Original Assignee: Samsung Aerospace Industries, Ltd. (Korea Aerospace Industries Limited)
• Inventors: Jung, Yeon-Wook
• Primary Examiner(s): Moses, Richard
• Assistant Examiner(s): VIRMANI, SHIVAL P
• Application Number:
  US08/611,906
• Time in Patent Office: 1,539 Days
• Field of Search: 355/53, 355/54, 355/55, 355/61, 355/77, 356/399, 356/400, 356/401
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70066 Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
• CPC Class Codes: G03F 7/70475 Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display

Abstract

A light-exposing device for making a semiconductor device. A reticle has patterns to be exposed to light. A blind controls a light-exposing area of the reticle. An optical system between the blind and the reticle condenses light passing through the blind. Adjacent patterns on a reticle are consecutively projected by superimposing light-exposing energy. An extra optical system condenses light passing through the blind. The usable area of the reticle is maximized; the interval between patterns is not critical; and inferiority by either lack or excess of the exposure to light between the patterns is reduced.

Claims

1. A light-exposing device for making a semiconductor device, comprising:

a reticle having patterns to be exposed to light;

a blind for controlling a light-exposing area of the reticle;

a condenser lens for condensing light from a light source; and

an optical system, placed between the blind and the reticle, comprising correction means for imaging the blind on the reticle in equi-magnification and for generating symmetrical aberrations within a predetermined range over the entire reticle.

2. A light-exposing device according to claim 1, wherein the symmetrical aberrations comprise a spherical aberration.

3. A light-exposing device according to claim 1, wherein the correction means comprises at least one of a correction plate and a correction lens which corrects asymmetrical aberrations resulting from the thickness and material of the reticle.

4. A light-exposing device according to the claim 1, wherein the reticle has a plurality of consecutive adjacent patterns.

5. A light-exposing device for manufacturing a semiconductor device, comprising:

a light source for producing a dot of light;

a reflector for diffusing the dot of light into a surface of light;

a condenser lens for condensing light from the reflector;

a reticle having a plurality of patterns;

a blind for controlling a light-exposing area of the reticle;

a projection lens for projecting a pattern of the reticle; and

correction means, placed between the blind and the reticle, for imaging the blind on the reticle in equi-magnification and for generating symmetrical aberrations within a predetermined range over the entire reticle.

6. A light-exposing device according to the claim 5, wherein the reticle has a plurality of consecutive adjacent patterns.

7. A light-exposing device according to claim 5, wherein the correction means comprises at least one of a correction plate and a correction lens which corrects asymmetrical aberrations resulting from the thickness and material of the reticle.