Apparatus and method for drying substrates

• US 6,067,727 A
• Filed: 11/06/1997
• Issued: 05/30/2000
• Est. Priority Date: 11/07/1996
• Status: Expired due to Term

• Current Assignee: SCREEN Holdings Co., Ltd.
• Original Assignee: SCREEN Holdings Co., Ltd.
• Inventors: Muraoka, Yusuke
• Primary Examiner(s): Bennett, Henry
• Assistant Examiner(s): GRAVINI, STEPHEN MICHAEL
• Application Number:
  US08/965,249
• Time in Patent Office: 936 Days
• Field of Search: 34/317, 34/325, 34/470, 34/58, 34/76, 34/77, 34/78, 134/19, 134/21, 134/902, 118/715, 118/725, 118/730
• US Class Current: 34/317
• CPC Class Codes: H01L 21/67034 for drying
• CPC Class Codes: H01L 21/68728 characterised by a plurality of separate clamping members, e.g. clamping fingers

Abstract

A cover is provided to an opening of a chamber in such a manner to open and close the opening and when the cover closes the opening, the chamber and the cover form a sealed drying process space. In this drying process space, nitrogen gas is supplied to purge the gas in the drying process space to turn into an inert gas filled space. Thereafter, substrates to be treated are brought into the drying process space. nitrogen gas is further supplied to the drying process space and then the substrates are being rotated to dry the same.

Claims

1. A substrate drying apparatus in which a substrate is dried by removing droplets adhering to the substrate, the substrate drying apparatus comprises:

a chamber with an opening through which the substrate enters and exits the chamber;

a cover sealing the opening;

inert gas supply means for supplying an inert gas into a sealed drying process space formed by the chamber and the cover;

an exhaust section exhausting the supplied inert gas out of the sealed drying process space; and

inert gas blowing means provided in a vicinity of the opening and adapted for blowing an inert gas against a substrate being brought into the chamber through the opening.

2. The substrate drying apparatus according to claim 1, further comprising depressurization means for reducing pressure in the drying process space.

3. The substrate drying apparatus according to claim 1, further comprising vapor supply means for supplying vapor of a water soluble alcohol into the drying process space.

4. A substrate drying apparatus in which a substrate is dried by removing droplets adhering to the substrate, the substrate drying apparatus comprises:

a chamber with an opening through which the substrate enters and exits the chamber;

a cover sealing the opening;

inert gas supply means for supplying an inert gas into a sealed drying process space formed by the chamber and the cover;

an exhaust section exhausting the supplied inert gas out of the sealed drying process space; and

steam supply means for supplying heating steam into the drying process space.

5. A substrate drying apparatus in which a substrate is dried by removing droplets adhering to the substrate, the substrate drying apparatus comprises:

a chamber with an opening through which the substrate enters and exits the chamber;

a cover sealing the opening;

inert gas supply means for supplying an inert gas into a sealed drying process space formed by the chamber and the cover;

an exhaust section exhausting the supplied inert gas out of the sealed drying process space;

depressurization means for reducing pressure in the drying process space; and

rotation means for removing liquid droplets adhering to the substrate by rotating the substrate.

6. A substrate drying apparatus in which a substrate is dried by removing droplets adhering to the substrate, the substrate drying apparatus comprises:

a chamber with an opening through which the substrate enters and exits the chamber;

a cover changeable between an open state and a close state with respect to the opening, and the cover and chamber defining a drying process space when the cover is in the close state;

inert gas supply means for supplying an inert gas into the drying process space defined by the chamber and the cover to fill the drying process space with the inert gas; and

rotation means for removing the liquid droplets adhering to the substrate by rotating the substrate.

7. The substrate drying apparatus according to claim 6, further comprising an ionizer for ionizing an inert gas supplied by the inert gas supply means.

8. The substrate drying apparatus according to claim 7, further comprising a reserve space in communication with the chamber, and the inert gas supply means and the ionizer are in the reserve space.

9. A method for drying a substrate in a drying space which is defined by a chamber, having an opening and an exhaust section, and a cover for opening and closing the opening, the method comprising the steps in the order of:

a) a step of purging gas in a sealed drying process space, defined by the chamber and the cover, through the exhaust section by supplying an inert gas;

b) a step of forming an inert gas curtain for closing the opening of the chamber;

c) a step of bringing the substrate into the chamber by opening the cover and thereafter bringing the substrate into the chamber through the opening;

d) a step of closing the opening with the cover; and

e) a step of drying the substance, said drying step including a sub step of rotating the substrate thereby drying the substrate.

10. A method for drying a substrate in a drying space which is defined by a chamber, having an opening and an exhaust section, and a cover for opening and closing the opening, the method comprising the steps in the order of:

a) a step of purging gas in a sealed drying process space, defined by the chamber and the cover, through the exhaust section by supplying an inert gas;

b) a step of forming an inert gas curtain for closing the opening of the chamber;

c) a step of bringing the substrate into the chamber by opening the cover and thereafter bringing the substrate into the chamber through the opening;

d) a step of closing the opening with the cover; and

e) a step of drying the substance, said drying step including a sub step of rotating the substrate while an inert gas is being supplied to the drying process space.

11. The method according to claim 10, wherein the step of drying further includes a sub step of ionizing a part of the inert gas supplied to the drying process space.

12. The method according to claim 10, further comprising a step of closing the exhaust section subsequent to the step of purging and prior to the step of bringing the substrate into the chamber.