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Method and lens arrangement to improve imaging performance of microlithography exposure tool

  • US 6,069,739 A
  • Filed: 06/30/1998
  • Issued: 05/30/2000
  • Est. Priority Date: 06/30/1998
  • Status: Expired due to Term
First Claim
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1. An apparatus for providing improved illumination uniformity by reducing spatial coherence of transmitted light to remove speckle comprising:

  • a light source for generating a coherent beam of light to provide the transmitted light; and

    a set of fly'"'"'s eye lens elements arranged to receive the transmitted light and disperse the transmitted light into a number of beamlets for projection onto a target, having the same focal length for imaging onto the target and, said lens elements having a plurality of lens media and a second medium disposed within at least one of said lens media, each said lens medium having a first light transition time, said second medium having a second light transition time different than said first light transition time.

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