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Alloy target, its fabrication, and regeneration processes

  • US 6,071,323 A
  • Filed: 03/02/1998
  • Issued: 06/06/2000
  • Est. Priority Date: 03/07/1997
  • Status: Expired due to Term
First Claim
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1. An alloy target used to form a magneto-optical recording layer by a magnetron sputtering technique, which comprises 20 to 30 at % of at least one rare earth metal element selected from the group consisting of terbium, dysprosium, gadolinium, samarium, neodymium, holmium, thulium and erbium with a substantial balance of a transition metal element necessarily including at least one element selected from the group consisting of iron, cobalt and nickel, and has a substantially homogeneous sintered structure in sheet form having a thickness of at least 8 mm and a permeability of up to 3.

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