Method of making a light reflector
First Claim
1. A method for fabricating a radiation reflector comprising the steps of:
- a) forming an etch mask on a silicon substrate to create a first window;
b) etching a cavity into the substrate at the site of the first window;
c) removing the etch mask;
d) filling the cavity with a sacrificial material;
e) planarizing the silicon substrate;
f) forming a second etch mask on the silicon substrate to create a window shaped as a current trace;
g) etching a first trench into the substrate at the site of the second window;
h) removing the second etch mask;
i) filling the trench with electrically conductive material;
j) planarizing the silicon substrate;
k) forming a third etch mask on the substrate to create a third window;
l) etching a second trench into the substrate at the site of the third window;
m) removing the third etch mask;
n) filling the second trench with a soft magnetic material;
o) applying a layer of membrane material to the silicon substrate;
p) forming openings in the layer of membrane material to form contact openings to the current trace, and a partial opening above the cavity with the sacrificial material;
q) forming and poling a thin film magnet in the partial opening above the cavity;
r) forming a reflective coating on the thin film magnent; and
s) etching out the sacrificial material from the cavity to complete the fabrication of the radiation reflector.
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Abstract
An improved microminiature radiation reflector is formed in a silicon support body with a fabricated cantilever member extending over a cavity that has been etched in the support body. The cantilever member has a reflection surface for reflecting incident radiation to a first position when the cantilever member is not deflected. An electromagnet is formed in the silicon support body adjacent the free end of the cantilever member for deflecting the cantilever member into the cavity of the support body so as to cause incident radiation to be reflected to a second position. An array of radiation reflectors is also disclosed for forming images from electrical signals applied to the electromagnets of selected ones of the radiation reflectors as a function of the position of their reflected radiation in the to be formed image.
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Citations
6 Claims
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1. A method for fabricating a radiation reflector comprising the steps of:
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a) forming an etch mask on a silicon substrate to create a first window; b) etching a cavity into the substrate at the site of the first window; c) removing the etch mask; d) filling the cavity with a sacrificial material; e) planarizing the silicon substrate; f) forming a second etch mask on the silicon substrate to create a window shaped as a current trace; g) etching a first trench into the substrate at the site of the second window; h) removing the second etch mask; i) filling the trench with electrically conductive material; j) planarizing the silicon substrate; k) forming a third etch mask on the substrate to create a third window; l) etching a second trench into the substrate at the site of the third window; m) removing the third etch mask; n) filling the second trench with a soft magnetic material; o) applying a layer of membrane material to the silicon substrate; p) forming openings in the layer of membrane material to form contact openings to the current trace, and a partial opening above the cavity with the sacrificial material; q) forming and poling a thin film magnet in the partial opening above the cavity; r) forming a reflective coating on the thin film magnent; and s) etching out the sacrificial material from the cavity to complete the fabrication of the radiation reflector. - View Dependent Claims (2, 3, 4, 5, 6)
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Specification
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- Resources
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Current AssigneeEastman Kodak Company
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Original AssigneeEastman Kodak Company
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InventorsFurlani, Edward P., Grande, William J., Ghosh, Syamal K.
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Primary Examiner(s)Niebling, John F.
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Assistant Examiner(s)Lattin, Christopher
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Application NumberUS09/179,503Time in Patent Office588 DaysField of Search438/3, 438/19, 438/48, 438/50, 438/953, 438/57, 438/72, 438/73, 438/78, 438/52, 257/659, 257/428, 257/415, 257/431, 257/437, 257/421, 359/291, 359/290, 359/846US Class Current438/52CPC Class CodesG02B 26/085 the reflecting means being ...
