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Method of making a light reflector

  • US 6,071,752 A
  • Filed: 10/27/1998
  • Issued: 06/06/2000
  • Est. Priority Date: 11/21/1996
  • Status: Expired due to Fees
First Claim
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1. A method for fabricating a radiation reflector comprising the steps of:

  • a) forming an etch mask on a silicon substrate to create a first window;

    b) etching a cavity into the substrate at the site of the first window;

    c) removing the etch mask;

    d) filling the cavity with a sacrificial material;

    e) planarizing the silicon substrate;

    f) forming a second etch mask on the silicon substrate to create a window shaped as a current trace;

    g) etching a first trench into the substrate at the site of the second window;

    h) removing the second etch mask;

    i) filling the trench with electrically conductive material;

    j) planarizing the silicon substrate;

    k) forming a third etch mask on the substrate to create a third window;

    l) etching a second trench into the substrate at the site of the third window;

    m) removing the third etch mask;

    n) filling the second trench with a soft magnetic material;

    o) applying a layer of membrane material to the silicon substrate;

    p) forming openings in the layer of membrane material to form contact openings to the current trace, and a partial opening above the cavity with the sacrificial material;

    q) forming and poling a thin film magnet in the partial opening above the cavity;

    r) forming a reflective coating on the thin film magnent; and

    s) etching out the sacrificial material from the cavity to complete the fabrication of the radiation reflector.

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