Methods for forming high-performing dual-damascene interconnect structures
First Claim
1. A method for forming a multi-level interconnect in an integrated circuit comprising a conductor, a cap dielectric layer, and a low-k dielectric layer, said method comprising the steps of:
- depositing a first hard mask layer over the low-k dielectric layer;
depositing a second hard mask layer over said first hard mask layer, wherein said second hard mask layer exhibits etch-selectivity with respect to the cap dielectric layer and the low-k dielectric layer, and said first hard mask layer is resistant to polishing-induced erosion;
polishing said second hard mask layer such that said second hard mask layer is substantially removed, and said first hard mask layer is substantially intact.
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Accused Products
Abstract
Dual damascene methods and structures are provided for IC interconnects which use a dual-damascene process incorporating a low-k dielectric material, high conductivity metal, and an improved hard mask scheme. A pair of hard masks are employed: a silicon dioxide layer and a silicon nitride layer, wherein the silicon dioxide layer acts to protect the silicon nitride layer during dual damascene etch processing, but is subsequently sacrificed during CMP, allowing the silicon nitride layer to act as a the CMP hard mask. In this way, delamination of the low-k material is prevented, and any copper-contaminated silicon dioxide material is removed.
215 Citations
17 Claims
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1. A method for forming a multi-level interconnect in an integrated circuit comprising a conductor, a cap dielectric layer, and a low-k dielectric layer, said method comprising the steps of:
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depositing a first hard mask layer over the low-k dielectric layer; depositing a second hard mask layer over said first hard mask layer, wherein said second hard mask layer exhibits etch-selectivity with respect to the cap dielectric layer and the low-k dielectric layer, and said first hard mask layer is resistant to polishing-induced erosion; polishing said second hard mask layer such that said second hard mask layer is substantially removed, and said first hard mask layer is substantially intact. - View Dependent Claims (2, 3, 4, 5)
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6. A method for forming an interconnect in an integrated circuit, said method comprising the steps of:
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(a) providing a substantially planar layer comprising a conductor and cap dielectric layer disposed thereupon; (b) forming a first low-k dielectric layer on said cap dielectric layer; (c) forming an etch stop layer over said first low-k dielectric layer; (d) patterning said etch stop layer in accordance with a via pattern; (e) forming a second low-k dielectric layer on said etch stop layer; (f) forming a first hard mask layer over said second low-k dielectric layer; (g) forming a second hard mask layer over said first hard mask layer; (h) patterning said first and second hard mask layers and said second low-k dielectric layer in accordance with a metal wiring pattern; (i) etching said first low-k dielectric layer in accordance with said via pattern, wherein said etch stop layer exhibits etch selectivity with respect to said first and second low-k dielectric layers; (j) etching said cap dielectric layer to expose said conductor, wherein said etch stop layer and said second hard mask layer exhibit etch selectivity with respect to said cap dielectric layer; (k) depositing a metal-layer such that said metal layer is electrically continuous with said conductor; (l) polishing away excess regions of said metal layer, wherein said first hard mask layer acts as a stop during polishing. - View Dependent Claims (7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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Specification