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Plasma reactor having an inductive antenna coupling power through a parallel plate electrode

  • US 6,077,384 A
  • Filed: 02/02/1996
  • Issued: 06/20/2000
  • Est. Priority Date: 08/11/1994
  • Status: Expired due to Term
First Claim
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1. A plasma reactor for processing a workpiece, said reactor comprising:

  • a reactor enclosure defining a chamber;

    a base within said chamber for supporting said workpiece;

    a semiconductor window overlying said base; and

    an inductive antenna adjacent a side of said semiconductor window opposite said base.

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