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Method and apparatus for monitoring plasma processing operations

  • US 6,077,386 A
  • Filed: 04/23/1998
  • Issued: 06/20/2000
  • Est. Priority Date: 04/23/1998
  • Status: Expired due to Fees
First Claim
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1. A plasma processing system, comprising:

  • a processing chamber comprising a window, wherein said window comprises an inner surface which is exposed to a plasma process conducted within said chamber and an outer surface which is isolated from said plasma process;

    means for generating a plasma within said processing chamber to conduct said plasma process within said processing chamber;

    means for obtaining optical emissions of said plasma within said chamber which are emitted through said window during said plasma process;

    means for evaluating said plasma process through output from said means for obtaining; and

    a calibration assembly operatively interconnected with said means for evaluating, said calibration assembly comprising means for calibrating said means for evaluating for each of first and second conditions, said first condition being a wavelength shift associated with said optical emissions which are used by said means for evaluating, said second condition being an intensity shift associated with said optical emissions which are used by said means for evaluating.

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