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Method of forming robust metal, metal oxide, and metal alloy layers on ion-conductive polymer membranes

  • US 6,077,621 A
  • Filed: 01/06/1998
  • Issued: 06/20/2000
  • Est. Priority Date: 01/22/1997
  • Status: Expired due to Term
First Claim
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1. A dual beam assisted deposition process for the purpose of an ion-conducting membrane provided with a thin metal or metal oxide film comprising subjecting the ion-conductive membrane under vacuum to an electron beam having an energy less than 500 eV to clean the membrane surface and subjecting the cleaned membrane under vacuum to a beam having an energy between 500 to 2000 eV and containing ions of the metal to be deposited to form the metal or metal oxide film.

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