Method of forming robust metal, metal oxide, and metal alloy layers on ion-conductive polymer membranes
First Claim
1. A dual beam assisted deposition process for the purpose of an ion-conducting membrane provided with a thin metal or metal oxide film comprising subjecting the ion-conductive membrane under vacuum to an electron beam having an energy less than 500 eV to clean the membrane surface and subjecting the cleaned membrane under vacuum to a beam having an energy between 500 to 2000 eV and containing ions of the metal to be deposited to form the metal or metal oxide film.
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Abstract
The invention is to a dual beam process for providing an ion-conducting membrane with a thin metal or metal-oxide film. The process includes the cleaning of a membrane surface with a low energy electron beam followed by the deposition of the metal or metal-oxide film by a high energy electron beam of ions.
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Citations
15 Claims
- 1. A dual beam assisted deposition process for the purpose of an ion-conducting membrane provided with a thin metal or metal oxide film comprising subjecting the ion-conductive membrane under vacuum to an electron beam having an energy less than 500 eV to clean the membrane surface and subjecting the cleaned membrane under vacuum to a beam having an energy between 500 to 2000 eV and containing ions of the metal to be deposited to form the metal or metal oxide film.
Specification