Field emission device having an amorphous multi-layered structure
First Claim
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1. A field emission device comprising:
- a substrate;
a conductive row being disposed on the substrate;
a non-conducting amorphous carbon layer including a layer of hydrogen-free amorphous carbon being non-conductive and being disposed on the substrate/conductive row;
a ballasted emission structure;
a conductive column being formed on the ballasted emission structure; and
an aperture being formed through the conductive column, the ballasted emission structure, and the non-conducting amorphous carbon layer thereby forming an emitter well and thereby exposing an emission edge of the ballasted emission structure being disposed within the emitter well and being emissive when exposed to an electric field having a field strength less than 150 volts/micrometer.
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Abstract
An amorphous multi-layered structure (100, 200) is formed by a method including the steps of: i) positioning a deposition substrate (101) in a physical vapor deposition apparatus, (300, 400, 500) ii) ionizing a precursor of a multi-phase material within the physical vapor deposition apparatus (300, 400, 500) iv) modulating the total ion impinging energy of the ions to deposit layers having predetermined properties corresponding to the total ion impinging energy values.
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Citations
5 Claims
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1. A field emission device comprising:
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a substrate; a conductive row being disposed on the substrate; a non-conducting amorphous carbon layer including a layer of hydrogen-free amorphous carbon being non-conductive and being disposed on the substrate/conductive row; a ballasted emission structure; a conductive column being formed on the ballasted emission structure; and an aperture being formed through the conductive column, the ballasted emission structure, and the non-conducting amorphous carbon layer thereby forming an emitter well and thereby exposing an emission edge of the ballasted emission structure being disposed within the emitter well and being emissive when exposed to an electric field having a field strength less than 150 volts/micrometer. - View Dependent Claims (2, 3)
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4. A field emission device comprising:
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a substrate; a conductive row being disposed on the substrate; a ballasted emission structure being formed on the substrate/conductive row; a non-conducting amorphous carbon layer including a layer of hydrogen-free amorphous carbon being non-conductive and being disposed on the ballasted emission structure; a conductive column being formed on the non-conducting amorphous carbon layer; and an aperture being formed through the conductive column and the non-conducting amorphous carbon layer thereby forming an emitter well and thereby exposing an electron emission surface of the ballasted emission structure, the electron emission surface being disposed within the emitter well and being emissive when exposed to an electric field having a field strength less than 150 volts/micrometer. - View Dependent Claims (5)
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Specification