Comparing aerial image to SEM of photoresist or substrate pattern for masking process characterization
First Claim
1. In the field of semiconductor processing, a method of simulating a masking process, comprising:
- providing a process simulator, wherein said simulator is configured to receive input information comprising a digital representation of a patterned mask and a data set wherein each element of said data set corresponds to one of a plurality of parameters associated with said masking process, said simulator further configured to produce an aerial image based upon said input information, wherein said aerial image represents said simulator'"'"'s estimation of a pattern that would be produced by said masking process using said patterned mask under conditions specified by said data set;
supplying said input information to said simulator to produce said aerial image,generating a first database comprising a digital representation of said aerial image;
producing said pattern on a semiconductor substrate using said masking process and said patterned mask under the conditions specified by said data set;
generating a second database comprising a digital representation of said pattern;
comparing said first database with said second database to produce an error database indicative of differences between said aerial image and said pattern; and
modifying said process simulator based upon said error database to minimize said differences between a successive iteration of said aerial image and said pattern.
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Abstract
A method of simulating a masking process in which a process simulator is used to produce an aerial image. The simulator is configured to receive input information. The input information includes a digital representation of a patterned mask and a data set. Each element of the data set corresponds to one of a plurality of parameters associated with the masking process. The simulator is configured to produce an aerial image based upon the input information. The aerial image represents the simulator estimation of a pattern that would be produced by the masking process using the patterned mask under conditions specified by the data set. The method further includes the step of supplying the input information to the simulator to produce the aerial image. A first data base is then generated from the aerial image. The first data base is a digital representation of the aerial image. Thereafter, the pattern is produced on a semiconductor substrate using the masking process and the patterned mask. The pattern is produced under the conditions specified by the data set. A second data base is then generated wherein the second data base is a digital representation of the actual pattern. The first data base and the second data base are then compared to produce an error data base. The error data base is indicative of differences between the aerial image and the pattern. Thereafter, the process simulator is modified based upon the error data base to minimize the differences between a successive iteration of the aerial image and the pattern.
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Citations
13 Claims
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1. In the field of semiconductor processing, a method of simulating a masking process, comprising:
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providing a process simulator, wherein said simulator is configured to receive input information comprising a digital representation of a patterned mask and a data set wherein each element of said data set corresponds to one of a plurality of parameters associated with said masking process, said simulator further configured to produce an aerial image based upon said input information, wherein said aerial image represents said simulator'"'"'s estimation of a pattern that would be produced by said masking process using said patterned mask under conditions specified by said data set; supplying said input information to said simulator to produce said aerial image, generating a first database comprising a digital representation of said aerial image; producing said pattern on a semiconductor substrate using said masking process and said patterned mask under the conditions specified by said data set; generating a second database comprising a digital representation of said pattern; comparing said first database with said second database to produce an error database indicative of differences between said aerial image and said pattern; and modifying said process simulator based upon said error database to minimize said differences between a successive iteration of said aerial image and said pattern. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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Specification