×

Method and apparatus for constant composition delivery of hydride gases for semiconductor processing

  • US 6,080,297 A
  • Filed: 06/05/1998
  • Issued: 06/27/2000
  • Est. Priority Date: 12/06/1996
  • Status: Expired due to Term
First Claim
Patent Images

1. A method for consistent composition delivery of a product gas stream including a hydride gas, comprising:

  • electrochemically generating a first gas feed stream including a hydride gas, said first gas feed stream having a varying level of the hydride gas over time;

    mixing said first gas feed stream with a second gas including a diluent gas, to form a product gas stream including a level of the diluent gas and a level of the hydride gas;

    monitoring the level of the diluent gas and the hydride gas in said product gas stream; and

    executing control software for maintaining a predetermined ratio of said hydride gas to said diluent gas in said product stream over time, the execution of said control software causing variation in an amount of said second gas provided to said mixing step in response to said monitored level, so as to form said product gas having said predetermined ratio of gases.

View all claims
  • 4 Assignments
Timeline View
Assignment View
    ×
    ×