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Packaging method of thin film passive components on silicon chip

  • US 6,083,766 A
  • Filed: 09/20/1999
  • Issued: 07/04/2000
  • Est. Priority Date: 07/01/1999
  • Status: Expired due to Fees
First Claim
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1. A packaging method of thin film passive components on a silicon chip comprising the steps of:

  • (a) forming an oxidized silicon substrate;

    (b) forming thin film passive components on the substrate including the sub-steps of;

    (b-1) forming a resistor layer and a first metallic conductive layer in sequence on the substrate by sputter deposition or vapor deposition technology and forming a resistor pattern on the resistor layer by photolithography and etching technologies, and forming a pattern for the two electrodes of the resistor on the first metallic conductive layer;

    (b-2) forming a dielectric layer on the first metallic conductive layer by sputter deposition or CVD technology and forming a dielectric layer pattern by photolithography and etching technologies; and

    (b-3) forming a second metallic conductive layer on the dielectric layer by sputter deposition or vapor deposition and forming a second metallic conductive layer pattern by photolithography and etching technologies;

    (c) forming a passivation layer by screen printing, and processing marking, polishing, and cutting to form a plurality of chips;

    (d) forming an appropriate shape of a ceramic substrate used in the thick film passive component by a first cutting and a second cutting;

    (e) coating an adhesive on the surface of the ceramic substrate;

    (f) adhering the silicone chips onto the surface of the ceramic which is coated with the adhesive under an appropriate temperature and pressure;

    (g) packaging by the method of thick film packaging, comprising the steps of(g-1) forming terminations and drying same;

    (g-2) electroplating the electrode;

    (g-3) testing the electrical characteristics of the formed integrated RC component; and

    (g-4) packaging all the obtained RC components.

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