Packaging method of thin film passive components on silicon chip
First Claim
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1. A packaging method of thin film passive components on a silicon chip comprising the steps of:
- (a) forming an oxidized silicon substrate;
(b) forming thin film passive components on the substrate including the sub-steps of;
(b-1) forming a resistor layer and a first metallic conductive layer in sequence on the substrate by sputter deposition or vapor deposition technology and forming a resistor pattern on the resistor layer by photolithography and etching technologies, and forming a pattern for the two electrodes of the resistor on the first metallic conductive layer;
(b-2) forming a dielectric layer on the first metallic conductive layer by sputter deposition or CVD technology and forming a dielectric layer pattern by photolithography and etching technologies; and
(b-3) forming a second metallic conductive layer on the dielectric layer by sputter deposition or vapor deposition and forming a second metallic conductive layer pattern by photolithography and etching technologies;
(c) forming a passivation layer by screen printing, and processing marking, polishing, and cutting to form a plurality of chips;
(d) forming an appropriate shape of a ceramic substrate used in the thick film passive component by a first cutting and a second cutting;
(e) coating an adhesive on the surface of the ceramic substrate;
(f) adhering the silicone chips onto the surface of the ceramic which is coated with the adhesive under an appropriate temperature and pressure;
(g) packaging by the method of thick film packaging, comprising the steps of(g-1) forming terminations and drying same;
(g-2) electroplating the electrode;
(g-3) testing the electrical characteristics of the formed integrated RC component; and
(g-4) packaging all the obtained RC components.
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Abstract
The present invention relates to a packaging method of thin film passive components on silicon chip, which employs ceramic or glass substrate to be mounted with the silicon chip so as to improve the mechanical strength of the components, and to a method of using thick film packaging technology to package the component. The cycle time of packaging is saved and the production cost is low.
40 Citations
8 Claims
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1. A packaging method of thin film passive components on a silicon chip comprising the steps of:
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(a) forming an oxidized silicon substrate; (b) forming thin film passive components on the substrate including the sub-steps of; (b-1) forming a resistor layer and a first metallic conductive layer in sequence on the substrate by sputter deposition or vapor deposition technology and forming a resistor pattern on the resistor layer by photolithography and etching technologies, and forming a pattern for the two electrodes of the resistor on the first metallic conductive layer; (b-2) forming a dielectric layer on the first metallic conductive layer by sputter deposition or CVD technology and forming a dielectric layer pattern by photolithography and etching technologies; and (b-3) forming a second metallic conductive layer on the dielectric layer by sputter deposition or vapor deposition and forming a second metallic conductive layer pattern by photolithography and etching technologies; (c) forming a passivation layer by screen printing, and processing marking, polishing, and cutting to form a plurality of chips; (d) forming an appropriate shape of a ceramic substrate used in the thick film passive component by a first cutting and a second cutting; (e) coating an adhesive on the surface of the ceramic substrate; (f) adhering the silicone chips onto the surface of the ceramic which is coated with the adhesive under an appropriate temperature and pressure; (g) packaging by the method of thick film packaging, comprising the steps of (g-1) forming terminations and drying same; (g-2) electroplating the electrode; (g-3) testing the electrical characteristics of the formed integrated RC component; and (g-4) packaging all the obtained RC components. - View Dependent Claims (2, 3, 4)
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5. A packaging method of thin film passive components on a silicon chip comprising the steps of:
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(a) forming an oxidized silicon substrate; (b) forming thin film passive components on the substrate including the sub-steps of; (b-1) forming a resistor layer and a first metallic conductive layer in sequence on the substrate by sputter deposition or vapor deposition technology and forming a resistor pattern on the resistor layer by photolithography and etching technologies, and forming a pattern for the two electrodes of the resistor on the first metallic conductive layer; (b-2) forming a dielectric layer on the first metallic conductive layer by sputter deposition or CVD technology and forming a dielectric layer pattern by photolithography and etching technologies; and (b-3) forming a second metallic conductive layer on the dielectric layer by sputter deposition or vapor deposition and forming a second metallic conductive layer pattern by photolithography and etching technologies; (c) forming a passivation layer by screen printing, and processing marking, polishing, and cutting to form a plurality of chips; (d) forming an appropriate shape of a glass substrate used in the thick film passive component by a first cutting and a second cutting; (e) coating an adhesive on the surface of the glass substrate; (f) adhering the chips onto the surface of the glass substrate which is coated with the adhesive under an appropriate temperature and pressure; (g) packaging by the method of thick film packaging, comprising the steps of (g-1) forming terminations and drying same; (g-2) electroplating the electrode; (g-3) testing the electrical characteristics of the formed integrated RC component; and (g-4) packaging all the obtained RC components. - View Dependent Claims (6, 7, 8)
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Specification