Programmable mask for exposure apparatus
First Claim
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1. A programmable mask for a stepper exposure system, the programmable mask comprising:
- an exposing pattern formed by an array structure of a pixel type micro-device which has an optical shutter or optical reflector function activated by an electrical pattern information for exposure,wherein said micro-device includes an actuator placed between a transparent electrode and an opaque electrode, and selectively passes a light which can expose a photoresist according to an electrical input signal, andsaid actuator is driven by an electrical signal applied to said opaque electrode.
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Abstract
This invention discloses a programmable mask for exposure apparatus which is formed by an integrated pixels of a micro-devices which shut or open a light by an electrical signal. This invention provides a photolithography method by projecting on a silicon wafer a directly designed circuit pattern which is made on a programmable mask fabricated by an integration of many a micro optical shutter devices as a pixels.
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1 Claim
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1. A programmable mask for a stepper exposure system, the programmable mask comprising:
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an exposing pattern formed by an array structure of a pixel type micro-device which has an optical shutter or optical reflector function activated by an electrical pattern information for exposure, wherein said micro-device includes an actuator placed between a transparent electrode and an opaque electrode, and selectively passes a light which can expose a photoresist according to an electrical input signal, and said actuator is driven by an electrical signal applied to said opaque electrode.
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Specification
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Current AssigneeElectronics and Telecommunications Research Institute
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Original AssigneeElectronics and Telecommunications Research Institute
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InventorsKim, Bo Woo, Lee, Yong Il, Jang, Won Ick, Choi, Chang Auck, Lee, Jong Hyun, Baek, Jong Tae
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Primary Examiner(s)Metjahic, Safet
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Assistant Examiner(s)NGUYEN, HUNG
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Application NumberUS09/141,554Time in Patent Office676 DaysField of Search430/5, 430/20, 430/22, 355/53, 355/71, 355/67, 355/72, 355/74, 355/75, 359/2, 359/4, 359/5US Class Current355/71CPC Class CodesG03F 7/70291 Addressable masks, e.g. spa...
