Elongated pressure sensor for a pressure transmitter

• US 6,089,097 A
• Filed: 03/03/1997
• Issued: 07/18/2000
• Est. Priority Date: 02/28/1995
• Status: Expired due to Term

• Current Assignee: Rosemount Incorporated (Emerson Electric Company)
• Original Assignee: Rosemount Incorporated (Emerson Electric Company)
• Inventors: Toy, Adrian C., Louwagie, Bennett L., Frick, Roger L.
• Primary Examiner(s): FELBER, JOSEPH LEON
• Application Number:
  US08/807,999
• Time in Patent Office: 1,233 Days
• Field of Search: 73/756, 73/724, 73/718, 73/716, 73/717, 73/720, 73/727, 73/721, 361/283.4, 324/661, 324/662, 324/668
• US Class Current: 73/718
• CPC Class Codes: G01L 9/0075 using a ceramic diaphragm, e.g. alumina, fused quartz, glass
• CPC Class Codes: G01L 9/125 with temperature compensating means non electric temperature compensating means G01L19/04
• CPC Class Codes: Y10T 29/49142 including metal fusion

Abstract

A transmitter in a process control system transmits a pressure over a process control loop. The transmitter includes I/O circuitry, compensation circuitry and an absolute pressure sensor. The I/O circuitry transmits information over the process control loop. Compensation circuitry receives a pressure related signal and responsively controls the I/O circuitry to transmit pressure information on the loop. The absolute pressure sensor includes a cavity which deforms as the sensor deflects in response to an applied pressure. A sensor in the cavity provides the pressure related signal to the compensation circuitry in response to the deformation.

Claims

1. A pressure transmitter for use in an industrial process control system for transmitting pressure on a process control loop, the transmitter comprising:

I/O circuitry coupling to the loop for transmitting information on the loop;

compensation circuitry receiving a pressure related signal and responsively controlling the I/O circuitry to transmit pressure information on the loop;

a transmitter housing containing the I/O circuitry and the compensation circuitry;

a mounting portion in the housing formed of a mounting portion material;

a process barrier in the housing positioned between the I/O circuitry and the compensation circuitry which isolates the I/O circuitry from the compensation circuitry and the mounting portion;

an elongated member formed substantially of a brittle, corrosion-resistant material which is different from the mounting portion material and is coupled to the mounting portion at a proximal end and having a passageway extending therethrough;

a pressure responsive portion at a distal end of the elongated member for immersion in a fluid which is at a pressure related to the process fluid pressure and deforming in response to process fluid pressure; and

a sensor coupled to the pressure responsive portion and having an electrical connection to the compensation circuitry through the passageway of the elongated portion and a sealed feed-through in the process barrier, wherein the sensor and electrical connection are isolated from process fluid by the elongated member;

wherein the elongated member and pressure responsive portion include fusion bonds which are substantially free of foreign material.

2. The pressure transmitter of claim 1 wherein the elongated member defines a cavity therethrough for applying a reference pressure to the pressure responsive portion.

3. The pressure transmitter of claim 1 including a second elongated member coupled to the mounting portion and carrying a second pressure responsive portion having a second sensor coupled to the compensation circuitry, wherein the pressure information relates to a differential pressure.

4. The pressure transmitter of claim 1 wherein the elongated member and the pressure responsive portion have a width w and a thickness T, and w/T is less than about 4.0.

5. The pressure transmitter of claim 4 wherein the elongated member and the pressure responsive portion have a width w and a thickness T, and w/T is less than about 2.3.

6. The pressure transmitter of claim 5 wherein the elongated member and the pressure responsive portion have a width w and a thickness T, and w/T is less than about 1.0.

7. The pressure transmitter of claim 1 including electrical conductors implanted in the elongated member and providing the electrical connection between the sensor and the compensation circuitry.

8. The pressure transmitter of claim 1 wherein the elongated member has a length L exposed to process fluid and a maximum width W and L/W is greater than about 3.0.

9. A pressure transmitter for use in an industrial process control system for transmitting a process variable related to pressure on a process control loop, comprising:

an elongated stress isolated pressure responsive structure of a brittle, corrosion resistant material comprising a first substrate of single crystal material bonded to a second substrate of single crystal material and having a passageway extending through a pressure responsive portion to a distal end;

a capacitance sensor coupled to the pressure responsive portion of the pressure responsive structure providing a capacitive output in response to deformation of the pressure responsive portion due to an applied pressure from a process fluid; and

transmitter circuitry coupled to the sensor adapted to measure the process variable related to the applied pressure and responsively transmit the process variable on the process control loop;

wherein the bond between the substrates is a fusion bond which is substantially free of foreign material and has a bond strength substantially equal to the single crystal material strength and is formed at a temperature between about 65 percent and 95 percent of an absolute temperature corresponding to a melting point of the material.

10. The pressure transmitter of claim 9 wherein the pressure responsive structure has a cavity formed therein with a width w and a thickness T, and w/T is less than about 4.0.

11. The pressure transmitter of claim 9 wherein the passageway provides a reference pressure proximate the capacitance sensor.

12. The pressure transmitter of claim 9 wherein the pressure responsive structure includes electrical conductors extending therethrough able to withstand a temperature used to form the bond.

13. The pressure transmitter of claim 12 wherein the electrical conductors are implanted in the pressure responsive structure.

14. The pressure transmitter of claim 12 wherein the material comprises sapphire.

15. A pressure transmitter for use in an industrial process control system for transmitting a process variable related to pressure of a process fluid on a process control loop, comprising:

an elongated pressure responsive structure of a single crystal, corrosion-resistant material, the elongated structure having a width w and a thickness T for coupling to a process fluid;

a capacitance sensor coupled to a distal end of the pressure responsive structure providing a capacitive output in response to deformation of the distal end of the pressure responsive structure due to an applied pressure from a process fluid; and

transmitter circuitry coupled to the sensor adapted to measure the process variable related to the applied pressure and responsively transmit the process variable on the process control loop;

wherein w/T is less than about 4.0 and the elongated pressure responsive structure is bonded together by fusion bonds which are substantially free of foreign material.

16. The pressure transmitter of claim 15 wherein the pressure responsive structure includes more than one substrate and a bond between substrates is a fusion bond which has a strength substantially equal to the single crystal material strength and is formed at a bonding temperature between about 65 percent and about 95 percent of an absolute temperature corresponding to a melting point of the material.

17. The pressure transmitter of claim 16 including electrical conductors in the pressure responsive structure having a melting point greater than the bonding temperature.

18. The pressure transmitter of claim 15 wherein the elongated pressure responsive structure includes a cavity extending therethrough for providing a reference pressure proximate the capacitance sensor.

19. The pressure transmitter of claim 15 including electrical conductors implanted in the pressure responsive structure.

20. The pressure transmitter of claim 15 wherein th pressure responsive structure is coupled to a pressure transmitter housing by a stress isolating structure of the same single crystal, corrosion-resistant material.

21. The pressure transmitter of claim 20 wherein the pressure responsive structure and stress isolating structure are surrounded by and directly exposed to process pressure fluid.

22. The pressure transmitter of claim 15 wherein a joint between the pressure responsive structure and the pressure transmitter housing is a fusion bond.

23. The pressure transmitter of claim 15 wherein the capacitance sensor includes conducting electrodes formed of conducting strips on opposing surfaces of a cavity gap.

24. The pressure transmitter of claim 23 wherein the conducting strips have width and spacing substantially equal or less than a cavity gap spacing.

25. The pressure transmitter of claim 15 wherein the material comprises sapphire.

30. The transmitter of claim 24 wherein the reference pressures are coupled together and are equal.

31. The transmitter of claim 30 wherein the reference pressures are substantially independent of process pressure.

26. A transmitter for use in an industrial process control system for providing an output related to a differential pressure of a process fluid, comprising:

a transmitter body;

a first pressure responsive structure formed substantially of a single crystal material coupled to a first process pressure;

a first sensing element coupled to the first pressure responsive structure having an output related to the response of the first pressure responsive structure to the first process pressure;

a first elongated stress isolation member extending between and coupling the first pressure responsive structure to the transmitter body, the first stress isolation member formed substantially of the single crystal material;

a second pressure responsive structure formed substantially of a single crystal material coupled to a second process pressure;

a second sensing element coupled to the second pressure responsive structure having an output related to the response of the second pressure responsive structure to the second process pressure;

a second elongated stress isolation member extending between and coupling the second pressure responsive structure to the transmitter body, the second stress isolation member formed substantially of the single crystal material; and

output circuitry in the transmitter body coupled to the first and second sensing elements for determining the difference in pressure between the first and second process pressures and providing an output related to a differential pressure therebetween;

wherein the pressure responsive structures and the elongated stress isolation members included are formed by substrates coupled together by fusion bonds which are substantially free from foreign material.

27. The transmitter of claim 26 wherein the first and second pressure responsive members are exposed directly to the process fluid and the single crystal material is substantially resistant to corrosion due to the process fluid.

28. The transmitter of claim 26 wherein the first and second sensing elements comprise capacitor electrodes and the output is a capacitance related to pressure.

29. The transmitter of claim 26 wherein the first and second pressure responsive structures are coupled to first and second reference pressures and the pressure sensing structures are responsive to a difference between a reference pressure and a process pressure.

32. The transmitter of claim 29 wherein the reference pressure is substantially a vacuum.

33. The transmitter of claim 29 wherein the reference pressure is transmitted via a gas.

34. The transmitter of claim 26 wherein the single crystal material is sapphire.

35. The transmitter of claim 26 wherein the first and second pressure responsive structures are maintained at substantially the same temperature by the transmitter housing.

36. The transmitter of claim 35 wherein the pressure responsive structures are spaced apart such that they maintain a temperature differential within a predetermined range over a predetermined temperature gradient in the transmitter housing.

37. The transmitter of claim 26 wherein a process pressure range is greater than 1000 psi and a differential pressure range is less than 30 psi.

38. The transmitter of claim 26 wherein each pressure responsive structure is maintained at a substantially uniform temperature throughout.