Low residue aqueous hard surface cleaning and disinfecting compositions

• US 6,090,771 A
• Filed: 07/26/1999
• Issued: 07/18/2000
• Est. Priority Date: 10/24/1996
• Status: Expired due to Term

• Current Assignee: Reckitt Benckiser LLC (Reckitt Benckiser Group PLC)
• Original Assignee: Reckitt Benckiser Incorporated (Reckitt Benckiser Group PLC)
• Inventors: Harrison, Kenneth A., Weller, Jeanne Marie, Burt, Diane Joyce, Lynch, Ann Marie
• Primary Examiner(s): Gupta, Yogendra
• Assistant Examiner(s): BOYER, CHARLES I
• Application Number:
  US09/360,667
• Time in Patent Office: 358 Days
• Field of Search: 510/199, 510/237, 510/362, 510/363, 510/382, 510/384, 510/409, 510/411, 510/424, 510/490, 510/503, 510/504
• US Class Current: 510/384
• CPC Class Codes: C11D 1/62 Quaternary ammonium compounds
• CPC Class Codes: C11D 1/72 Ethers of polyoxyalkylene glycols
• CPC Class Codes: C11D 1/75 Amino oxides
• CPC Class Codes: C11D 1/835 Mixtures of non-ionic with cationic compounds
• CPC Class Codes: C11D 1/94 Mixtures with anionic, cationic or non-ionic compounds
• CPC Class Codes: C11D 2111/42 Application of foam or a temporary coating on the surface to be cleaned
• CPC Class Codes: C11D 3/2068 Ethers
• CPC Class Codes: C11D 3/30 Amines; Substituted amines ; Quaternized amines
• CPC Class Codes: C11D 3/43 Solvents
• CPC Class Codes: C11D 3/48 Medical, disinfecting agents, disinfecting, antibacterial, germicidal or antimicrobial compositions

Abstract

Aqueous based cleaning compositions simultaneously featuring disinfecting, low residue deposit and good cleaning characteristics are provided. The compositions include one or more quaternary amine compounds as disinfecting active agents, an organic solvent system which includes glycol mono-n-butyl ether or a binary system including a glycol ether with a linear primary alcohol, and either one or more betaines, or one or more amine oxides as a surfactant constituent.

Claims

1. A low residue aqueous cleaning and disinfecting composition comprising, per 100% wt.:

A) 0.05-0.3% wt. of a quaternary ammonium surfactant compound having germicidal properties;

B) 0.05-10% wt. of a solvent system selected from;

a propylene glycol n-butyl ether solvent, or a binary solvent combination of a glycol ether with a C₈ -C₁₈ linear primary alcohol;

C) 0.2-3.0% wt. of a surfactant compound selected from amine oxide compounds;

D) in excess of 0.5% wt. of one or more alkanolamines;

E) to 100% wt. water.

2. The low residue aqueous hard surface cleaning and disinfecting composition according to claim 1 wherein the solvent system (B) is solely propylene glycol mono-n-butyl ether.

3. A low residue aqueous hard surface cleaning and disinfecting composition according to claim 1 wherein the solvent system (B) is a glycol ether and a C₆ -C₁₈ linear primary alcohol.

4. The low residue hard surface cleaning and disinfecting composition according to claim 1 wherein the alkanolamine is a mono-, di- or tri-alkanolamine.

5. The low residue hard surface cleaning and disinfecting composition according to claim 1 wherein the quaternary ammonium germicide is in accordance with the following general structural formula:

##STR4## where;

at least one or R₁, R₂, R₃ and R₄ is a alkyl, aryl or alkylaryl substituent of from 6 to 26 carbon atoms, which may include one or more amide, ether or ester linkages;

remaining R₁, R₂, R₃ and R₄ are straight-chained or branched, hydrocarbons usually containing not more than 12 carbon atoms, which may include one or more amide, ether or ester linkages;

and, X is a salt-forming anion.

6. The low residue hard surface cleaning and disinfecting composition according to claim 5 wherein the quaternary ammonium germicide is in accordance with the following general structural formula:

##STR5## where;

R₂, R₃ may be C₈ -C₁₂ alkyl, or when R₂ is C_12-16 alkyl, C_8-18 alkylethoxy, C_8-18 alkylphenolethoxy, R₃ is benzyl;

X is a halide.

7. A composition according to claim 1 further characterized in that the composition forms a substantially uniform film during evaporative drying subsequent to application on a hard surface.

8. A composition according to claim 1 further characterized in that the composition is phase stable when subjected to an elevated temperature of 120°

F. for a period of at least 4weeks.

9. A process for the cleaning and disinfecting of a hard surface in need of such treatment which comprises the step of:

applying an effective amount of the composition according to claim 1.

10. The composition according to claim 1 which further contains from 0 to about 0.5% wt. of one or more optional constituents.