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Plasma processing apparatus utilizing a microwave window having a thinner inner area

  • US 6,091,045 A
  • Filed: 11/26/1997
  • Issued: 07/18/2000
  • Est. Priority Date: 03/28/1996
  • Status: Expired due to Term
First Claim
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1. A plasma processing apparatus comprising:

  • a reaction chamber having an upper opening for supplying microwaves;

    a sample stage being settled inside said reaction chamber, to place a sample;

    a microwave generator;

    a waveguide connected to said microwave generator for supplying the microwave provided by said generator; and

    a microwave window covering the upper opening of reaction chamber, to introduce the microwave supplied through said waveguide into the reaction chamber,wherein an inner area of said microwave window directly confronting a sample which is placed on said sample stage is thinner than an outer area of said microwave window,wherein said inner area is at least as large as said sample,wherein said inner area of said microwave window has an unobstructed view of all of said sample stage, andwherein said microwave window is larger than said sample stage.

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