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Method and system for anomaly detection

  • US 6,091,846 A
  • Filed: 05/30/1997
  • Issued: 07/18/2000
  • Est. Priority Date: 05/31/1996
  • Status: Expired due to Term
First Claim
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1. A system for detecting anomalies on a semiconductor wafer, the system comprising:

  • a moveable stage for holding and positioning the semiconductor wafer;

    a camera for capturing an image of the semiconductor wafer;

    a digitizer coupled to the camera for producing a digital-pixel-based representation of the image;

    a computer having a processor and memory, the computer coupled to the digitizer for receiving the digital-pixel-based representation from the digitizer and coupled to the stage for selectively moving the stage to align the wafer; and

    the computer is programmed to be operable to;

    symbolically decompose the digital-pixel-based representation of an image to create a primitive-based representation of the image,the computer further operable to develop a histogram of angles and lengths of geometric objects within the image and compare the histogram to a reference histogram of a reference image to determine rotational shift of the image.

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