High aspect ratio microstructures and methods for manufacturing microstructures
First Claim
1. A method for fabricating a selected pattern at least 6 microns thick in a resist at least 6 microns thick;
- wherein the pattern comprises at least one feature having a resolution of 10 microns or smaller and having an aspect ratio of 60 or greater; and
wherein said method comprises the steps of;
(a) forming a transfer mask lithographically, wherein the transfer mask adheres to the surface of the resist, wherein the transfer mask comprises portions that correspond to the pattern and that are opaque to radiation to which the resist is sensitive, wherein the transfer mask comprises other portions that are transparent to radiation to which the resist is sensitive, wherein the opaque portions corresponding to the pattern have either a positive tone or a negative tone relative to the pattern, wherein the resist has a positive tone if the opaque portions of the pattern have a positive tone relative to the pattern, wherein the resist has a negative tone if the opaque portions of the pattern have a negative tone relative to the pattern;
(b) exposing the resist and the transfer mask to radiation to which the resist is sensitive, whereby portions of the resist underlying the opaque portions of the transfer mask are not exposed to the radiation, and whereby portions of the resist underlying the transparent portions of the transfer mask are exposed to the radiation; and
(c) developing the resist to selectively remove the radiation-exposed portions of the resist if the resist has a positive tone;
or to selectively remove the unexposed portions of the resist if the resist has a negative tone;
whereby the pattern is formed in the resist.
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Accused Products
Abstract
A method is disclosed for the manufacture of microstructures and devices. The method is relatively easy to implement, and has the capability to produce features having a resolution of ten microns or smaller with a high aspect ratio (60, 75, 100, 200, or even higher). A master mask, appropriately designed and fabricated, is used in an initial exposure step with visible light, ultraviolet light, x-rays, an electron beam, or an ion beam to make a "transfer mask" directly on the surface of the sample. It is not necessary to produce an expensive x-ray master mask, even if x-ray exposure of the sample is desired. There is no necessity for gap control during exposure of the resist through the transfer mask. The resulting structures may, if desired, have a higher aspect ratio than microstructures that have previously been produced through other methods. The "transfer mask" is not a unit separate from the sample, but is formed directly on the surface of each sample. A conventional-type master mask is used to form the "transfer mask" with visible light, ultraviolet light, x-rays, an electron beam, or an ion beam. The total cost is determined primarily by the cost of the master mask. Because the master mask can be a conventional-type optical mask, the high cost of producing a conventional x-ray mask can be avoided. The "master mask" is used to form a "transfer mask" on each sample individually. The patterned transfer mask comprises a thin layer of an absorber of the radiation to be used in the final exposure. For example, if the final exposure is to be performed with soft x-rays, the transfer mask may be formed from an x-ray absorber such as a patterned layer of gold. The transfer mask is then used in one or more separate exposures of the underlying resist. An analogous method may be used for radiation-assisted chemistry, such as etching or deposition, on the surface of a sample.
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Citations
21 Claims
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1. A method for fabricating a selected pattern at least 6 microns thick in a resist at least 6 microns thick;
- wherein the pattern comprises at least one feature having a resolution of 10 microns or smaller and having an aspect ratio of 60 or greater; and
wherein said method comprises the steps of;(a) forming a transfer mask lithographically, wherein the transfer mask adheres to the surface of the resist, wherein the transfer mask comprises portions that correspond to the pattern and that are opaque to radiation to which the resist is sensitive, wherein the transfer mask comprises other portions that are transparent to radiation to which the resist is sensitive, wherein the opaque portions corresponding to the pattern have either a positive tone or a negative tone relative to the pattern, wherein the resist has a positive tone if the opaque portions of the pattern have a positive tone relative to the pattern, wherein the resist has a negative tone if the opaque portions of the pattern have a negative tone relative to the pattern; (b) exposing the resist and the transfer mask to radiation to which the resist is sensitive, whereby portions of the resist underlying the opaque portions of the transfer mask are not exposed to the radiation, and whereby portions of the resist underlying the transparent portions of the transfer mask are exposed to the radiation; and (c) developing the resist to selectively remove the radiation-exposed portions of the resist if the resist has a positive tone;
or to selectively remove the unexposed portions of the resist if the resist has a negative tone;
whereby the pattern is formed in the resist. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
- wherein the pattern comprises at least one feature having a resolution of 10 microns or smaller and having an aspect ratio of 60 or greater; and
Specification