High aspect ratio microstructures and methods for manufacturing microstructures

• US 6,093,520 A
• Filed: 07/18/1996
• Issued: 07/25/2000
• Est. Priority Date: 09/09/1994
• Status: Expired due to Fees

• Current Assignee: Board of Supervisors of Louisiana State University Agricultural & Mechanical College (Louisiana State University System)
• Original Assignee: Board of Supervisors of Louisiana State University Agricultural & Mechanical College (Louisiana State University System)
• Inventors: Vladimirsky, Yuli, Vladimirsky, Olga, Saile, Volker
• Primary Examiner(s): Nuzzolillo, Maria
• Assistant Examiner(s): WEINER, LAURA S
• Application Number:
  US08/295,898
• Time in Patent Office: 1,468 Days
• Field of Search: 430/311, 430/325, 430/326, 430/396, 430/397, 430/942, 430/966, 430/967
• US Class Current: 430/326
• CPC Class Codes: G03F 7/00 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using photoresist structures for special production processes, see the relevant places, e.g. B44C, H01L, e.g. H01L21/00, H05K
• CPC Class Codes: G03F 7/0017 for the production of embossing, cutting or similar devices; for the production of casting means
• CPC Class Codes: G03F 7/094 Multilayer resist systems, e.g. planarising layers
• CPC Class Codes: G03F 7/095 having more than one photosensitive layer G03F7/075 takes precedence
• CPC Class Codes: G03F 7/11 having cover layers or intermediate layers, e.g. subbing layers G03F7/091 - G03F7/093, B41N3/03 take precedence
• CPC Class Codes: Y10S 430/143 Electron beam
• CPC Class Codes: Y10S 430/167 X-ray
• CPC Class Codes: Y10S 430/168 X-ray exposure process

Abstract

A method is disclosed for the manufacture of microstructures and devices. The method is relatively easy to implement, and has the capability to produce features having a resolution of ten microns or smaller with a high aspect ratio (60, 75, 100, 200, or even higher). A master mask, appropriately designed and fabricated, is used in an initial exposure step with visible light, ultraviolet light, x-rays, an electron beam, or an ion beam to make a "transfer mask" directly on the surface of the sample. It is not necessary to produce an expensive x-ray master mask, even if x-ray exposure of the sample is desired. There is no necessity for gap control during exposure of the resist through the transfer mask. The resulting structures may, if desired, have a higher aspect ratio than microstructures that have previously been produced through other methods. The "transfer mask" is not a unit separate from the sample, but is formed directly on the surface of each sample. A conventional-type master mask is used to form the "transfer mask" with visible light, ultraviolet light, x-rays, an electron beam, or an ion beam. The total cost is determined primarily by the cost of the master mask. Because the master mask can be a conventional-type optical mask, the high cost of producing a conventional x-ray mask can be avoided. The "master mask" is used to form a "transfer mask" on each sample individually. The patterned transfer mask comprises a thin layer of an absorber of the radiation to be used in the final exposure. For example, if the final exposure is to be performed with soft x-rays, the transfer mask may be formed from an x-ray absorber such as a patterned layer of gold. The transfer mask is then used in one or more separate exposures of the underlying resist. An analogous method may be used for radiation-assisted chemistry, such as etching or deposition, on the surface of a sample.

Claims

1. A method for fabricating a selected pattern at least 6 microns thick in a resist at least 6 microns thick;

wherein the pattern comprises at least one feature having a resolution of 10 microns or smaller and having an aspect ratio of 60 or greater; and

wherein said method comprises the steps of;

(a) forming a transfer mask lithographically, wherein the transfer mask adheres to the surface of the resist, wherein the transfer mask comprises portions that correspond to the pattern and that are opaque to radiation to which the resist is sensitive, wherein the transfer mask comprises other portions that are transparent to radiation to which the resist is sensitive, wherein the opaque portions corresponding to the pattern have either a positive tone or a negative tone relative to the pattern, wherein the resist has a positive tone if the opaque portions of the pattern have a positive tone relative to the pattern, wherein the resist has a negative tone if the opaque portions of the pattern have a negative tone relative to the pattern;

(b) exposing the resist and the transfer mask to radiation to which the resist is sensitive, whereby portions of the resist underlying the opaque portions of the transfer mask are not exposed to the radiation, and whereby portions of the resist underlying the transparent portions of the transfer mask are exposed to the radiation; and

(c) developing the resist to selectively remove the radiation-exposed portions of the resist if the resist has a positive tone;

or to selectively remove the unexposed portions of the resist if the resist has a negative tone;

whereby the pattern is formed in the resist.

2. A method as recited in claim 1, wherein the resist has a positive tone, wherein the opaque portions of the pattern have a positive tone relative to the pattern, and wherein the opaque portions of the transfer mask comprise gold.

3. A method as recited in claim 1, wherein the resist has a negative tone, wherein the opaque portions of the pattern have a negative tone relative to the pattern, and wherein the opaque portions of the transfer mask comprise tungsten.

4. A method as recited in claim 1, wherein said exposing step and said developing step are each repeated a plurality of times, and wherein the transfer mask is in the same position relative to the resist during each of said exposing steps.

5. A method as recited in claim 1, wherein during said exposure step the position of the resist is scanned relative to the position of the radiation, or wherein during said exposure step the position of the radiation is scanned relative to the position of the resist.

6. A method as recited in claim 1, wherein during said exposure step the position of the resist is rotated relative to the position of the radiation, or wherein during said exposure step the position of the radiation is rotated relative to the position of the resist.

7. A method as recited in claim 1, wherein the transfer mask additionally comprises portions that are semi-opaque to radiation to which the resist is sensitive, whereby in said exposing step portions of the resist underlying the semi-opaque portions of the transfer mask are partially exposed to radiation;

and whereby in said developing step the partially-exposed portions of the resist are removed to a lesser depth than the depth to which the fully-exposed portions of the resist are removed.

8. A method as recited in claim 1, wherein the radiation comprises x-rays.

9. A method as recited in claim 1, wherein the radiation comprises visible light.

10. A method as recited in claim 1, wherein the radiation comprises ultraviolet light.

11. A method as recited in claim 1, wherein the radiation comprises an electron beam.

12. A method as recited in claim 1, wherein the radiation comprises an ion beam.

13. A method as recited in claim 1, additionally comprising the step of removing the transfer mask after the pattern is formed in the resist.

14. A method as recited in claim 1, wherein the angle of incidence of the radiation on the surface of the transfer mask is 90°

.

15. A method as recited in claim 1, wherein the angle of incidence of the radiation on the surface of the transfer mask is less than 90°

.

16. A method as recited in claim 1, wherein the angle of incidence of the radiation on the surface of the transfer mask changes with time during said exposing step.

17. A method as recited in claim 1, wherein the surface of the transfer mask and the surface of the resist are not flat.

18. A method as recited in claim 1, wherein the shape of the transfer mask and the shape of the resist change with time during said exposing step.

19. A method as recited in claim 1, wherein the pattern fabricated in the resist comprises at least one feature having a resolution of 10 microns or smaller and having an aspect ratio of 60 or greater.

20. A method as recited in claim 1, wherein said exposing step and said developing step are each repeated a plurality of times;

wherein the transfer mask is in the same position relative to the resist during each of said exposing steps; and

wherein the angle of incidence of the radiation on the surface of the transfer mask changes between said exposing steps.

21. A method as recited in claim 1, wherein said exposing step and said developing step are each repeated a plurality of times, and wherein the shape of the transfer mask and the shape of the resist change between said exposing steps.