Method for forming a critical dimension test structure and its use

• US 6,094,256 A
• Filed: 09/29/1998
• Issued: 07/25/2000
• Est. Priority Date: 09/29/1998
• Status: Expired due to Term

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Precision Incorporated (Nikon Corporation)
• Inventors: Grodnensky, Ilya, Ushida, Kazuo, Johnson, Eric R., Suwa, Kyoichi
• Primary Examiner(s): Metjahic, Safet
• Assistant Examiner(s): NGUYEN, HUNG
• Application Number:
  US09/163,049
• Time in Patent Office: 665 Days
• Field of Search: 355/53, 355/50, 355/77, 355/67, 430/5, 430/20, 430/22, 430/30, 356/399-401
• US Class Current: 355/77
• CPC Class Codes: G03F 7/70591 Testing optical components
• CPC Class Codes: G03F 7/706 Aberration measurement
• CPC Class Codes: G03F 7/70625 Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
• CPC Class Codes: G03F 7/70633 Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
• CPC Class Codes: G03F 7/70683 Mark designs

Abstract

A method for forming a critical dimension test mark, and the use of the mark to characterize and monitor imaging performance is provided. Methods in accordance with the present invention encompass an exposure of an essentially standard critical dimension bar at each of two overlapping orientations that are rotated about an axis with respect to each other. The overlapped portion forming a critical dimension test mark that is useful for enabling low cost, rapid determination of sub-micron critical dimensions for characterizing exposure tool imaging performance and in-process performance monitoring using optical measurement systems.

Claims

1. A method of forming a critical dimension test structure (CDTM) image comprising:

providing an exposure system having an image plane and an object plane;

providing an image forming layer overlying a substrate disposed in said image plane, said image forming layer requiring a nominal exposure energy to form an image;

providing a first feature disposed in said object plane wherein said first feature has a first orientation and a first critical dimension;

projecting said first feature onto said image forming layer at a first exposure energy less than the nominal exposure energy; and

providing a second feature disposed in said object plane wherein said second feature has a second orientation and a second critical dimension;

projecting said second feature onto said imaging forming layer at a second exposure energy less than the nominal energy wherein a doubly exposed region in said image forming layer is formed where said first feature and said second feature overlap, said doubly exposed region being exposed with a total exposure energy approximately equal to the nominal exposure energy; and

forming said CDTM image in said image forming layer, the CDTM image comprising said doubly exposed region, and having a dimension representative of the average of the first critical dimension and the second test critical dimension.

2. The method of claim 1 wherein providing an exposure system comprises providing a photolithographic system or an electron beam exposure system.

3. The method of claim 1 wherein providing a second feature comprises changing the orientation of said first feature from said first orientation to said second orientation.

4. The method of claim 1 wherein providing an image forming layer comprises providing a positive image forming photoresist layer.

5. The method of claim 4 wherein forming said CDTM image in said image forming layer comprises treating said image forming layer with an image developing material.

6. The method of claim 1 wherein providing a second feature comprises providing the second feature having the second critical dimension essentially equal to the first critical dimension.

7. The method of claim 1 wherein providing a second feature comprises providing the second feature having the second critical dimension different than the first critical dimension.

8. The method of claim 1 wherein providing an image forming layer comprises providing an image forming device such as a CCD array.

9. A critical dimension test structure formed by the method of claim 1.

10. The critical dimension test structure of claim 9, wherein said critical dimension test structure has an essentially diamond-shaped conformation.

11. A method for characterizing the imaging performance of an exposure tool for sub-micron imaging comprising:

forming a plurality of critical dimension test structure (CDTM) images in the manner of claim 1, said plurality of images disposed within an exposure field of said exposure tool, each CDTM image having a location;

measuring a dimension of each CDTM image, at each location, using an optical measuring system;

correlating each dimension measured to a sub-micron critical dimension wherein a matrix of sub-micron critical dimensions and locations is formed; and

evaluating said matrix to identify non-uniform locations.

12. The method of claim 11 wherein correlating said measured length comprises using a linear relationship that provides for:

space="preserve" listing-type="equation">K.sub.il ×

CD=L sin (α

/2)

where;

K_il is an experimentally determined constant;

L is the measured length;

CD is the critical dimension; and

α

is an angle formed between the two orientations.

13. A method for monitoring imaging performance of an exposure tool comprising:

providing an image forming layer overlying a substrate in an image plan of said exposure tool, said image forming layer characterized in part by an image forming empirical constant determined for said image forming layer and image processing thereof;

blanking a portion of an exposure field while exposing, at a nominal exposure energy, a remaining portion of said image forming layer in said exposure field through a reticle positioned in an object plane of said exposure tool;

performing a first exposure of a first feature, at a first exposure energy, within said previously blanked portion, said first feature having a first critical dimension and a first orientation, wherein said first exposure energy is less than said nominal exposure energy;

performing a second exposure of a second feature, at a second exposure energy, within said previously blanked portion, said second feature having a second critical dimension, approximately equal to said first critical dimension, and a second orientation, wherein said second orientation overlaps a portion of said first orientation and is rotated with respect to said first orientation by a predetermined angle, and wherein said second exposure energy is less than said nominal exposure energy and wherein a sum of said first and second exposure energies is approximately equal to said nominal exposure energy;

forming a critical dimension test structure (CDTM) of said overlap portion;

measuring a dimension of said CDTM; and

determining a critical dimension from said measured CDTM using a linear relationship that provides for;

space="preserve" listing-type="equation">K.sub.il ×

CD=L sin (α

/2)

where

K_il is the empirical constant of the image forming layer;

L is the dimension of the CDTM, and

α

is the predetermined angle.

14. The method of claim 13 wherein performing a second exposure with a second feature comprises providing the second feature having the second critical dimension essentially equal to the first critical dimension.

15. The method of claim 13 wherein performing a second exposure with a second feature comprises providing the second feature having the second critical dimension smaller than the first critical dimension.

16. A method for monitoring image performance of an exposure tool comprising:

providing an image forming layer overlying a substrate in an image plane of said exposure tool, said image forming layer characterized in part by an image forming empirical constant determined for said image forming layer and image processing thereof;

blanking a portion of an exposure field while exposing, at a nominal exposure energy, a remaining portion of said image forming layer in said exposure field through a reticle positioned in an object plane of said exposure tool;

performing a first exposure of a first feature, at a first exposure energy, within said previously blanked portion, said first feature having a critical dimension and a first orientation, wherein said first exposure energy is less than said nominal exposure energy;

performing a second exposure of a second feature, at a second exposure energy, within said previously blanked portion, said second feature having a second critical dimension, approximately equal to said first critical dimension, and a second orientation, wherein said second orientation overlaps a portion of said first orientation and is rotated with respect to said first orientation by a predetermined angle, and wherein said second exposure energy is less than said nominal exposure energy and wherein a sum of said first and second exposure energies is approximately equal to said nominal exposure energy;

forming a critical dimension test structure (CDTM) of said overlap portion;

measuring a dimension of said CDTM; and

determining a critical dimension from said measured CDTM.

17. The method of claim 16 wherein determining the critical dimension from said measured CDTM comprises using a linear relationship that provides for:

space="preserve" listing-type="equation">K.sub.il ×

CD=L sin (α

/2)

where

K_il is the empirical constant of the image forming layer,

L is the dimension of the CDTM, and

α

is the predetermined angle.