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Formation of microchannels from low-temperature plasma-deposited silicon oxynitride

  • US 6,096,656 A
  • Filed: 06/24/1999
  • Issued: 08/01/2000
  • Est. Priority Date: 06/24/1999
  • Status: Expired due to Term
First Claim
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1. A method for forming a fluid microchannel in a substrate, comprising steps for:

  • (a) forming a trench below an upper surface of the substrate;

    (b) filling the trench with a sacrificial material;

    (c) forming at least one silicon oxynitride layer covering the trench; and

    (d) removing the sacrificial material from the trench, thereby forming the microchannel.

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