Method for producing a reflection type liquid crystal display

• US 6,097,459 A
• Filed: 06/24/1998
• Issued: 08/01/2000
• Est. Priority Date: 10/03/1994
• Status: Expired due to Term

• Current Assignee: Sharp Electronics Corporation (Hon Hai Precision Industry Co., Ltd.), Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Original Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Inventors: Mitsui, Seiichi, Shimada, Yasunori
• Primary Examiner(s): Dudek, James A.
• Application Number:
  US09/104,121
• Time in Patent Office: 769 Days
• Field of Search: 349/113, 349/187, 349/130
• US Class Current: 349/113
• CPC Class Codes: G02F 1/133553 Reflecting elements associated to illuminating devices G02F1/133605
• CPC Class Codes: G02F 2203/02 reflective

Abstract

A reflection type liquid crystal display comprises a first substrate including a rough portion formed on a surface thereof and a reflection electrode formed on the rough portion; a second substrate including a counter electrode formed thereon; and a liquid crystal layer interposed between the first and second substrates, driven by the reflection electrode and the counter electrode to perform a display. The reflection electrode is made of aluminum or aluminum alloy, and the reflection electrode includes surface oxidation layer having at least 5 nm thickness. The first substrate includes a vertical alignment film made of insulating material formed on the surface oxidation layer of the reflection electrode.

Claims

1. A method for producing a reflection type liquid crystal display comprising:

a first substrate including a rough portion formed on a surface thereof, a reflection electrode formed on the rough portion, the reflection electrode including a surface oxidation layer, and a vertical alignment film made of insulating material formed on the surface oxidation layer;

a second substrate including a counter electrode formed thereon; and

a liquid crystal layer interposed between the first and second substrates, driven by the reflection electrode and the counter electrode to perform a display, the method including the steps of;

pattering the reflection electrode from a thin metallic film made of aluminum or aluminum alloy which is formed on the first substrate covering the rough portion;

oxidizing a surface of the reflection electrode whereby forming a surface oxidation layer having a thickness of at least 5 nm;

applying vertical alignment film material at least on the surface oxidation layer; and

heating and curing the vertical alignment film material whereby forming the vertical alignment film.

2. A method for producing a reflection type liquid crystal display according to claim 1, wherein the surface oxidation layer is formed to have a thickness of 5 nm to 10 nm in the oxidizing step.

3. A method for producing a reflection type liquid crystal display according to claim 1, wherein the oxidizing step is performed in an atmosphere including oxygen and at a temperature 170°

C. to 200°

C. which is higher than a heating temperature of the heating and curing step.

4. A method for producing a reflection type liquid crystal display according to claim 1, wherein the oxidizing step is performed by soaking the reflection electrode in hydrogen peroxide solution or nitric acid solution.

5. A method for producing a reflection type liquid crystal display comprising:

a first substrate including a rough portion formed on a surface thereof, a reflection electrode formed on the rough portion, an oxide film formed on the reflection electrode, and a vertical alignment film made of insulating material formed on the oxide film;

a second substrate including a counter electrode formed thereon; and

a liquid crystal layer interposed between the first and second substrates, driven by the reflection electrode and the counter electrode to perform a display, the method including the steps of;

pattering the reflection electrode from a thin metallic film made of aluminum or aluminum alloy which is formed on the first substrate covering the rough portion;

forming an oxide film on the first substrate so as to cover the reflection electrode;

applying vertical alignment film material on the oxidized film; and

heating and curing the vertical alignment film material whereby forming the vertical alignment film.

6. A method for producing a reflection type liquid crystal display according to claim 5, wherein the oxide film is formed to have a thickness of 50 nm to 100 nm in the forming step.

7. A method for producing a reflection type liquid crystal display according to claim 5, wherein the oxide film is made of silicon oxide.