Method of manufacturing semiconductor article

• US 6,100,165 A
• Filed: 11/14/1997
• Issued: 08/08/2000
• Est. Priority Date: 11/15/1996
• Status: Expired due to Fees

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Sakaguchi, Kiyofumi, Yonehara, Takao
• Primary Examiner(s): Niebling, John F.
• Assistant Examiner(s): Zarneke, David A.
• Application Number:
  US08/971,040
• Time in Patent Office: 998 Days
• Field of Search: 438/455, 438/458, 438/928, 438/960, 438/609, 438/406, 438/409
• US Class Current: 438/455
• CPC Class Codes: H01L 21/76259 with separation/delamination along a porous layer
• CPC Class Codes: H01L 2924/00 Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/0002 Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
• CPC Class Codes: Y10S 438/928 Front and rear surface processing
• CPC Class Codes: Y10S 438/96 Porous semiconductor
• CPC Class Codes: Y10S 438/977 Thinning or removal of substrate

Abstract

A method of manufacturing a semiconductor article comprises steps of forming a diffusion region at least on the surface of one of the sides of a silicon substrate by diffusing an element capable of controlling the conduction type, forming a porous silicon layer in a region including the diffusion region, preparing a first substrate by forming a nonporous semiconductor layer on the porous silicon layer, bonding the first substrate and a second substrate together to produce a multilayer structure with the nonporous semiconductor layer located inside, splitting the multilayer structure along the porous silicon layer but not along the diffusion region and removing the porous silicon layer remaining on the split second substrate.

Claims

1. A method of manufacturing a semiconductor article, characterized by comprising steps of:

forming a diffusion region at least on the surface of one of the sides of a silicon substrate by diffusing an element capable of controlling the conduction type;

forming a porous silicon layer in a region including said diffusion region;

preparing a first substrate by forming a nonporous semiconductor layer on said porous silicon layer;

bonding said first substrate and a second substrate together to produce a multilayer structure with said nonporous semiconductor layer located inside;

splitting said multilayer structure along said porous silicon layer but not along said diffusion region; and

removing the porous silicon layer remaining on said split second substrate.

2. A method of manufacturing a semiconductor article according to claim 1, wherein said step of forming a diffusion region is performed by means of a diffusion technique.

3. A method of manufacturing a semiconductor article according to claim 2, wherein said element capable of controlling the conduction type is an element capable of controlling the conduction type of silicon to the n-type.

4. A method of manufacturing a semiconductor article according to claim 3, wherein said element capable of controlling the conduction type is selected from P, As and Sb.

5. A method of manufacturing a semiconductor article according to claim 2, wherein said element capable of controlling the conduction type is an element capable of controlling the conduction type of silicon to the p-type.

6. A method of manufacturing a semiconductor article according to claim 5, wherein said element capable of controlling the conduction type is B.

7. A method of manufacturing a semiconductor article according to claim 2, wherein said diffusion technique is adapted to thermally diffuse said element into said silicon substrate.

8. A method of manufacturing a semiconductor article according to claim 6, wherein said element capable of controlling the conduction type is supplied in the form of gas.

9. A method of manufacturing a semiconductor article according to claim 8, wherein said gas is B₂ H₆.

10. A method of manufacturing a semiconductor article according to claim 6, wherein said element capable of controlling the conduction type is supplied in the form of liquid.

11. A method of manufacturing a semiconductor article according to claim 10, wherein said liquid is BBr₃.

12. A method of manufacturing a semiconductor article according to claim 6, wherein said element capable of controlling the conduction type is supplied in the form of solid.

13. A method of manufacturing a semiconductor article according to claim 12, wherein said solid is B₂ O₃.

14. A method of manufacturing a semiconductor article according to claim 6, wherein said element capable of controlling the conduction type is supplied from a solid object arranged on said silicon substrate.

15. A method of manufacturing a semiconductor article according to claim 14, wherein said solid object is selected from CVD film, BSG and spin-coated film.

16. A method of manufacturing a semiconductor article according to claim 2, wherein the concentration of said element capable of controlling the conduction type and contained i n said diffusion region is controlled within a range between 5.0×

10¹⁶ /cm³ and 5.0×

10²⁰ /cm³.

17. A method of manufacturing a semiconductor article according to claim 16, wherein the concentration of said element capable of controlling the conduction type and contained in said diffusion region is controlled within a range between 1.0×

10¹⁷ /cm³ and 2.0×

10²⁰ /cm³.

18. A method of manufacturing a semiconductor article according to claim 17, wherein the concentration of said element capable of controlling the conduction type and contained in said diffusion region is controlled within a range between 5.0×

10¹⁷ /cm³ and 1.0×

10²⁰ /cm³.

19. A method of manufacturing a semiconductor article according to claim 2, wherein the thickness of said diffusion layer is controlled within a range between 100 Å

and 100 μ

m.

20. A method of manufacturing a semiconductor article according to claim 19, wherein the thickness of said diffusion layer is controlled within a range between 500 Å

and 50 μ

m.

21. A method of manufacturing a semiconductor article according to claim 20, wherein the thickness of said diffusion layer is controlled within a range between 5,000 Å

and 30 μ

m.

22. A method of manufacturing a semiconductor article according to claim 1, wherein the thickness of said porous silicon layer is controlled within a range between 1 μ

m and 150 μ

m.

23. A method of manufacturing a semiconductor article according to claim 22, wherein the thickness of said porous silicon layer is controlled within a range between 2 μ

m and 80 μ

m.

24. A method of manufacturing a semiconductor article according to claim 23, wherein the thickness of said porous silicon layer is controlled within a range between 5 μ

m and 50 μ

m.

25. A method of manufacturing a semiconductor article according to claim 1, wherein a diffusion region and a porous layer are formed on each of the oppositely disposed surfaces of said silicon substrate a nd subsequently a nonporous semiconductor layer is formed on each of said porous layers.

26. A met hod of manufacturing a semiconductor article according to claim 1, wherein said step of splitting said multilayer structure is performed by externally applying force to said porous layer.

27. A method of manufacturing a semiconductor article according to claim 26, wherein said application of force is performed by applying pressure, tensile force in a direction perpendicular to the substrate surface or shearing force.

28. A method of manufacturing a semiconductor article according to claim 1, wherein said step of splitting said multilayer structure is performed by exposing the porous silicon at an end of the structure and subsequently oxidizing the bonded substrates.

29. A method of manufacturing a semiconductor article according to claim 1, wherein said step of splitting said multilayer structure is performed by heating said multilayer structure.

30. A method of manufacturing a semiconductor article according to claim 29, wherein said heating is performed by entirely heating said porous multilayer structure.

31. A method of manufacturing a semiconductor article according to claim 29, wherein said heating is performed by partly heating said multilayer structure.

32. A method of manufacturing a semiconductor article according to claim 31, wherein said heating is performed by means of laser irradiation.

33. A method of manufacturing a semiconductor article according to claim 32, wherein said laser is carbon dioxide laser.

34. A method of manufacturing a semiconductor article according to claim 31, wherein said heating is performed by flowing an electric current through said porous silicon layer.

35. A method of manufacturing a semiconductor article according to claim 1, wherein said porous silicon layer is obtained by anodizing said silicon substrate.

36. A method of manufacturing a semiconductor article according to claim 1, wherein said nonporous semiconductor layer comprises a single crystal silicon layer.

37. A method of manufacturing a semiconductor article according to claim 36, wherein said single crystal silicon layer is formed by means of epitaxial growth.

38. A method of manufacturing a semiconductor article according to claim 36, wherein said first substrate is prepared by forming a silicon oxide layer on said single crystal silicon layer.

39. A method of manufacturing a semiconductor article according to claim 38, wherein said silicon oxide layer is formed by means of thermal oxidation.

40. A method of manufacturing a semiconductor article according to claim 1, wherein said porous semiconductor layer comprises a compound semiconductor layer.

41. A method of manufacturing a semiconductor article according to claim 40, wherein said compound semiconductor layer has single crystal structure.

42. A method of manufacturing a semiconductor article according to claim 1, wherein said second substrate comprises a single crystal silicon substrate.

43. A method of manufacturing a semiconductor article according to claim 1, wherein said second substrate is prepared by forming oxide film on the surface of said single crystal silicon substrate.

44. A method of manufacturing a semiconductor article according to claim 1, wherein said second substrate comprises a light transmitting substrate.

45. A method of manufacturing a semiconductor article according to claim 44, wherein said light transmitting substrate comprises a glass substrate.

46. A method of manufacturing a semiconductor article according to claim 1, wherein said bonding step is performed by bringing the two substrate into close contact with each other.

47. A method of manufacturing a semiconductor article according to claim 1, wherein said bonding step is performed by means of anodic bonding, pressurization and heat treatment.

48. A method of manufacturing a semiconductor article according to claim 1, wherein said step of removing said porous silicon layer is performed by means of polishing.

49. A method of manufacturing a semiconductor article according to claim 1, wherein said step of removing said porous silicon layer is performed by means of etching.

50. A method of manufacturing a semiconductor article according to claim 49, wherein said etching is performed by using hydrofluoric acid.

51. A method of manufacturing a semiconductor article, characterized by comprising steps of:

forming a diffusion region at least on the surface of one of the sides of a silicon substrate by diffusing an element capable of controlling the conduction type;

forming a porous silicon layer in a region including said diffusion region;

preparing a first substrate by forming a nonporous semiconductor layer on said porous silicon layer;

bonding said first substrate and a second substrate together to produce a multilayer structure with said nonporous semiconductor layer located inside;

splitting said multilayer structure along said porous silicon layer but not along said diffusion region;

removing the porous silicon layer remaining on said split second substrate; and

reusing the substrate obtained by removing the porous layer remaining on said separated first substrate as material of another first substrate.

52. A method of manufacturing a semiconductor article, characterized by comprising steps of:

forming a diffusion region at least on the surface of one of the sides of a silicon substrate by diffusing an element capable of controlling the conduction type;

forming a porous silicon layer in a region including said diffusion region;

preparing a first substrate by forming a nonporous semiconductor layer on said porous silicon layer;

bonding said first substrate and a second substrate together to produce a multilayer structure with said nonporous semiconductor layer located inside;

splitting said multilayer structure along said porous silicon layer but not along said diffusion region;

removing the porous silicon layer remaining on said split second substrate; and

reusing the substrate obtained by removing the porous layer remaining on said separated first substrate as material of another second substrate.

53. A method of manufacturing a semiconductor article, comprising:

forming a region incorporating an element capable of controlling the conduction type at least on the surface of a side of a silicon substrate;

forming a porous silicon layer in said region;

preparing a first substrate by forming a nonporous semiconductor layer on said porous silicon layer;

bonding said first substrate and a second substrate together to produce a multilayer structure with said nonporous semiconductor layer located inside;

splitting said multilayer structure along said porous silicon layer.

54. A method of manufacturing a semiconductor article, comprising:

forming a p-type region incorporating an element capable of controlling the conduction type at least on the surface of a side of a silicon substrate;

forming a porous silicon layer in said p-type region;

preparing a first substrate by forming a nonporous semiconductor layer on said porous silicon layer;

bonding said first substrate and a second substrate together to produce a multilayer structure with said nonporous semiconductor layer located inside;

splitting said multilayer structure along said porous silicon layer.

55. A method of manufacturing a semiconductor article, comprising:

forming a highly doped region incorporating an element capable of controlling the conduction type at least on the surface of one of the sides of a silicon substrate;

forming a porous silicon layer in said highly doped region;

preparing a first substrate by forming a nonporous semiconductor layer on said porous silicon layer;

bonding said first substrate and a second substrate together to produce a multilayer structure with said nonporous semiconductor layer located inside;

splitting said multilayer structure along said porous silicon layer.