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Apparatus for photolithography process with gas-phase pretreatment

  • US 6,106,167 A
  • Filed: 09/01/1998
  • Issued: 08/22/2000
  • Est. Priority Date: 09/01/1998
  • Status: Expired due to Term
First Claim
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1. A deep ultra-violet (DUV) track system, said system comprises:

  • an indexer end station for storing a substrate;

    a vapor-prime chamber connected to said indexer end station, wherein said substrate is heated and a chemical solution is applied on a surface of said substrate in said vapor-prime chamber before a photoresist layer is coated on said substrate, a base gas being introduced into said vapor-prime chamber to harden a surface of said photoresist layer;

    at least one chill-plate chamber connected to said vapor-prime chamber for bringing said substrate to a stable, constant temperature;

    a coater chamber connected to said chill-plate chamber for uniformly coating said photoresist layer on said substrate;

    at least one vacuum-bake chamber connected to said coater chamber for heating said photoresist layer;

    a stepper chamber connected to said vacuum-bake chamber through an interface chamber, wherein said photoresist layer is exposed in said stepper chamber; and

    a developer chamber connected to said chill-plate chamber, wherein exposed or unexposed portion of said photoresist layer is removed in said developer chamber.

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