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CMOS integrated circuit having a sacrificial metal spacer for producing graded NMOS source/drain junctions dissimilar from PMOS source/drain junctions

  • US 6,107,130 A
  • Filed: 11/10/1998
  • Issued: 08/22/2000
  • Est. Priority Date: 12/06/1996
  • Status: Expired due to Term
First Claim
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1. A method for forming a CMOS integrated circuit, comprising:

  • patterning a first gate conductor between opposing sidewall surfaces across a first channel portion of a semiconductor topography;

    using the first gate conductor as a mask, implanting a first n-type dopant into said semiconductor topography adjacent said channel portion;

    forming a dielectric spacer upon the sidewall surfaces;

    using the dielectric spacer and the first gate conductor as a mask, implanting a second n-type dopant into said semiconductor topography a first spaced distance from said channel portion;

    forming a conductive spacer upon the dielectric spacer; and

    using the conductive spacer, the dielectric spacer and the first gate conductor as a mask, implanting a third n-type dopant into said semiconductor topography a second spaced distance greater than the first spaced distance from said channel portion.

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