Plasma generating apparatus with multiple microwave introducing means
First Claim
1. A plasma generating apparatus for generating plasma in a prescribed region including a plasma processing region, comprising:
- a vacuum vessel having said plasma processing region therein and equipped with a vacuum evacuation means;
a discharge gas supplying means for supplying a discharge gas into said vacuum vessel;
a microwave emitting means for emitting microwaves into said vacuum vessel;
a microwave introducing means for introducing microwaves emitted by said microwave emitting means into said vacuum vessel; and
a magnetic field generating means for generating a magnetic field in said vacuum vessel;
wherein said microwave introducing means includes a plurality of tube-shaped or rod-shaped dielectric members arranged in parallel and inserted into said vacuum vessel; and
said magnetic field generating means includes a means for generating a magnetic field strong enough for creating an electron cyclotron resonance region with microwaves having a prescribed frequency in the vicinity of an inner wall of said vacuum vessel and a means for generating a magnetic field of less than or equal to 100 G in the region where said plurality of tube-shaped or rod-shaped dielectric members of said microwave introducing means are located.
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Accused Products
Abstract
A plasma generating apparatus capable of improving the uniformity of a plasma processing and coping with a larger diameter of a substrate is obtained. Microwaves are distributed and emitted from a waveguide through the branching portions of a T branch to four rod antennas. The microwaves are introduced through four dielectric tubes into a vacuum vessel. In the vacuum vessel, a multi-cusp magnetic field and an electron cyclotron resonance region are caused by permanent magnets located around the vessel and, by an interaction between a vibrational electric field of the microwaves and a magnetic field, highly uniform plasma is generated in a region where a substrate or the like is subjected to a plasma processing.
39 Citations
8 Claims
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1. A plasma generating apparatus for generating plasma in a prescribed region including a plasma processing region, comprising:
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a vacuum vessel having said plasma processing region therein and equipped with a vacuum evacuation means; a discharge gas supplying means for supplying a discharge gas into said vacuum vessel; a microwave emitting means for emitting microwaves into said vacuum vessel; a microwave introducing means for introducing microwaves emitted by said microwave emitting means into said vacuum vessel; and a magnetic field generating means for generating a magnetic field in said vacuum vessel; wherein said microwave introducing means includes a plurality of tube-shaped or rod-shaped dielectric members arranged in parallel and inserted into said vacuum vessel; and said magnetic field generating means includes a means for generating a magnetic field strong enough for creating an electron cyclotron resonance region with microwaves having a prescribed frequency in the vicinity of an inner wall of said vacuum vessel and a means for generating a magnetic field of less than or equal to 100 G in the region where said plurality of tube-shaped or rod-shaped dielectric members of said microwave introducing means are located. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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Specification