Method of manufacture of a thermal elastic rotary impeller ink jet print head

• US 6,110,754 A
• Filed: 07/10/1998
• Issued: 08/29/2000
• Est. Priority Date: 07/15/1997
• Status: Expired due to Term

• Current Assignee: Memjet Technology Ltd. (Memjet Limited)
• Original Assignee: Silverbrook Research Pty Limited
• Inventors: Silverbrook, Kia
• Primary Examiner(s): Chaudhuri, Olik
• Assistant Examiner(s): Mao, Daniel H.
• Application Number:
  US09/113,089
• Time in Patent Office: 781 Days
• Field of Search: 438/21, 347/54, 347/56, 347/57, 347/58, 347/59, 347/60, 347/61, 347/62, 347/63, 347/64, 347/65, 347/66, 347/67
• US Class Current: 438/21
• CPC Class Codes: B41J 2/14314 Structure of ink jet print heads with electrostatically actuated membrane
• CPC Class Codes: B41J 2/14427 Structure of ink jet print heads with thermal bend detached actuators
• CPC Class Codes: B41J 2/1626 etching
• CPC Class Codes: B41J 2/1628 dry etching
• CPC Class Codes: B41J 2/1629 wet etching
• CPC Class Codes: B41J 2/1631 photolithography
• CPC Class Codes: B41J 2/1632 machining
• CPC Class Codes: B41J 2/1639 sacrificial molding
• CPC Class Codes: B41J 2/1642 thin film formation by CVD [chemical vapor deposition]
• CPC Class Codes: B41J 2/1643 thin film formation by plating
• CPC Class Codes: B41J 2/1645 thin film formation by spincoating
• CPC Class Codes: B41J 2/1646 thin film formation by sputtering
• CPC Class Codes: B41J 2/1648 Production of print heads with thermal bend detached actuators
• CPC Class Codes: B41J 2/16585 for paper-width or non-reciprocating print heads
• CPC Class Codes: B41J 2/17596 Ink pumps, ink valves
• CPC Class Codes: B41J 2002/041 Electromagnetic transducer
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: G06K 1/121 by printing code marks applying code marks to labels B65C9/46; marking or coding completed packages B65B61/26
• CPC Class Codes: G06K 19/06037 multi-dimensional coding
• CPC Class Codes: G06K 7/14 using light without selection of wavelength, e.g. sensing reflected white light G06K7/10831 - G06K7/1097 take precedence
• CPC Class Codes: G06K 7/1417 : 2D bar codes
• CPC Class Codes: G11C 11/56 : using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
• CPC Class Codes: H04N 23/00 : Cameras or camera modules comprising electronic image sensors; Control thereof
• CPC Class Codes: H04N 5/2628 : Alteration of picture size, shape, position or orientation, e.g. zooming, rotation, rolling, perspective, translation

Abstract

This patent describes a method of manufacturing a thermoelastic rotary impeller ink jet print head wherein an array of nozzles are formed on a substrate utilizing planar monolithic deposition, lithographic and etching processes. Multiple ink jet heads are formed simultaneously on a single planar substrate such as a silicon wafer. The print heads can be formed utilizing standard VLSI/ULSI processing and can include integrated drive electronics formed on the same substrate. The drive electronics preferably being of a CMOS type. In the final construction, ink can be ejected from the substrate substantially normal to the substrate plane.

Claims

1. A method of manufacturing a thermoelastic rotary impeller ink jet print head wherein an array of nozzles are formed on a substrate utilising planar monolithic deposition, lithographic and etching processes.

2. A method as claimed in claim 1 wherein multiple ink jet heads are formed simultaneously on a single planar substrate.

3. A method as claimed in claim 2 wherein said substrate is a silicon wafer.

4. A method as claimed in claim 1 wherein said print heads are formed utilising standard vlsi/ulsi processing.

5. A method as claimed in claim 1 wherein integrated drive electronics are formed on the same substrate.

6. A method as claimed in claim 5 wherein said integrated drive electronics comprise a CMOS process.

7. A method as claimed in claim 1 wherein ink is ejected from said substrate substantially normal to said substrate.