Magnetically-enhanced plasma chamber with non-uniform magnetic field

• US 6,113,731 A
• Filed: 01/02/1997
• Issued: 09/05/2000
• Est. Priority Date: 01/02/1997
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Lindley, Roger, Plavidal, Richard, Qian, Xue Yu, Welch, Michael, Pu, Bryan, Bjorkman, Claes, Shan, Hongching, Ke, Kuang-Han, Li, Zongyu, Ding, Ji
• Primary Examiner(s): Dang, Thi
• Assistant Examiner(s): ALEJANDRO MULERO, LUZ L
• Application Number:
  US08/735,444
• Time in Patent Office: 1,342 Days
• Field of Search: 118/723 R, 118/723 MR, 118/723 MA, 156/345, 204/298.16, 204/298.37, 438/728, 438/732, 438/758, 315/111.41, 216/70, 216/67, 427/571
• US Class Current: 156/345.28
• CPC Class Codes: H01J 37/32623 Mechanical discharge control means
• CPC Class Codes: H01J 37/3266 Magnetic control means
• CPC Class Codes: H01L 21/67069 for drying etching
• CPC Class Codes: H01L 21/68735 characterised by edge profile or support profile

Abstract

A plasma chamber having a magnet which produces a magnetic field such that, within a region parallel to and adjacent to the workpiece, the direction of the magnetic field is approximately the vector cross product of (i) the gradient of the magnitude of the magnetic field, and (ii) a vector extending perpendicularly from the workpiece surface toward the plasma. Alternatively, the plasma chamber includes a north magnetic pole and a south magnetic pole located at distinct azimuths around the periphery of the workpiece. The azimuth of the south magnetic pole relative to the north magnetic pole is clockwise around the central axis, and each magnetic pole faces a direction which is more toward than away from a central axis of the workpiece area. An additional aspect of the invention is a plasma chamber having a rotating magnetic field produced by electromagnets spaced around the periphery of the workpiece which receive successive fixed amounts of electrical current during successive time intervals. During each transition between the time intervals, the current supplied to each electromagnet is changed relatively slowly or relatively quickly according to whether the current change includes a change in polarity.

Claims

1. A magnetically-enhanced plasma chamber for producing an improved instantaneous spatial uniformity of ion flux from the plasma to a semiconductor workpiece, comprising:

a chuck for holding a flat semiconductor workpiece so that the workpiece occupies a workpiece area;

a plasma source for producing a plasma in a first region above the workpiece area; and

a magnet configured to produce in a planar second region a magnetic field having a non-zero gradient such that, at every point in the second region, the magnetic field at that point has a direction that is approximately the vector cross product of (i) the gradient of the magnitude of the magnetic field at that point, and (ii) a vector extending perpendicularly from the workpiece area toward the plasma;

wherein the second region is parallel to and adjacent to the workpiece area and has a surface area substantially greater than half of the workpiece area;

wherein, at every instant, the magnetic field has a range of magnitudes in the second region which ranges between a minimum magnitude and a maximum magnitude, wherein the minimum magnitude occurs at only a single point; and

wherein, at every instant, the magnetic field has a clockwise curvature relative to said single point when viewed from above the workpiece area.

2. A chamber according to claim 1, wherein:

the workpiece area is bounded by a perimeter; and

the single point is located near the perimeter of the workpiece area.

3. A chamber according to claim 2, wherein the location of the single point revolves around the perimeter of the workpiece area over time.

4. A chamber according to claim 1, wherein the second region is coincident with the workpiece area.

5. A chamber according to claim 1, further comprising:

an electrical controller circuit for electrically adjusting the gradient of the magnetic field.

6. A chamber according to claim 5, wherein:

the chamber further comprises an electrical power supply;

the magnet comprises an electromagnet connected to receive electrical current from the power supply; and

the electrical controller circuit adjusts the amount of electrical current which the power supply provides to the electromagnet.

7. A magnetically-enhanced plasma chamber for producing an improved instantaneous spatial uniformity of ion flux from the plasma to a semiconductor workpiece, comprising:

a chuck for holding a semiconductor workpiece so that the workpiece occupies a workpiece area bounded by a perimeter;

a plasma source for producing a plasma in a region above the workpiece area;

a unitary magnet having a north magnetic pole and a south magnetic pole located at distinct azimuths around the perimeter of the workpiece area, wherein

each magnetic pole faces a direction which is more toward than away from the center of the workpiece area, and

the azimuth of the north magnetic pole minus the azimuth of the south magnetic pole is substantially greater than zero and substantially less than 180°

degrees in a direction counterclockwise around said perimeter when viewing the workpiece area from above.

8. A chamber according to claim 7, wherein the north magnetic pole and south magnetic pole have respective magnetic axes which are mutually perpendicular.

9. A magnetically-enhanced plasma chamber for producing an improved instantaneous spatial uniformity of ion flux from the plasma to a semiconductor workpiece, comprising:

a chuck for holding a semiconductor workpiece so that the workpiece occupies a workpiece area bounded by a perimeter;

a plasma source for producing a plasma in a region above the workpiece area; and

a first north magnetic pole, a first south magnetic pole, a second south magnetic pole, and a second north magnetic pole positioned at respective azimuths around the perimeter of the workpiece area which are progressively clockwise around the perimeter of the workpiece area when viewing the workpiece area from above, wherein

each magnetic pole faces a direction which is more toward than away from the center of the workpiece area, and

the first north magnetic pole and first south magnetic pole in combination produce a first magnetic field between them, the second north magnetic pole and second south magnetic pole in combination produce a second magnetic field between them, and the four magnetic poles are configured so that the first magnetic field is substantially stronger than the second magnetic field.

10. A chamber according to claim 9, wherein:

the first north magnetic pole and first south magnetic pole are the north and south poles, respectively, of a first magnet, and

the second north magnetic pole and second south magnetic pole are the north and south poles, respectively, of a second magnet.

11. A chamber according to claim 10, further comprising:

means for adjusting the ratio between the strength of the magnetic field produced by the first magnet and the strength of the magnetic field produced by the second magnet.

12. A chamber according to claim 11, wherein:

the chamber further comprises an electrical power supply;

one of the first and second magnets includes an electromagnet connected to receive electrical current from the power supply; and

the means for adjusting said magnetic field strength ratio includes a controller circuit for adjusting the current provided by the power supply to the electromagnet.

13. A chamber according to claim 11, wherein:

the first and second magnets respectively include first and second electromagnets; and

the means for adjusting said magnetic field strength ratio comprises an electrical power supply for providing electrical current to the first and second electromagnets, the power supply being adjustable for adjusting the ratio between the current the power supply provides to the first electromagnet and the current the power supply provides to the second electromagnet.

14. A chamber according to claim 9, wherein the first and second north magnetic poles and the first and second south magnetic poles are four distinct electromagnets.

15. A chamber according to claim 14, wherein:

the means for adjusting said magnetic field strength ratio comprises an electrical power supply for providing electrical current to the four electromagnets;

the power supply provides a first amount of current to both the first north electromagnet and the first south electromagnet;

the power supply provides a second amount of current to both the second north electromagnet and the second south electromagnet; and

the power supply is adjustable for adjusting the ratio between the first and second amounts of current.

16. A chamber according to claim 9, wherein:

the first north magnetic pole and the second south magnetic pole have respective magnetic axes which are parallel; and

the second north magnetic pole and the first south magnetic pole have respective magnetic axes which are perpendicular to the magnetic axes of the first north magnetic pole and the second south magnetic pole.

17. A chamber according to claim 9, further comprising:

a plurality of electromagnets at successively spaced positions around the periphery of the workpiece area; and

a power supply for providing electrical current to the electromagnets, wherein

the power supply provides different current signals to different ones of the electromagnets so as to produce said north and south magnetic poles, and

the power supply provides each of said different current signals to each of the electromagnets in succession so that the electromagnets produce a rotating magnetic field.

18. A chamber according to claim 9, further comprising:

means for adjusting the ratio between the strength of the first magnetic field and the strength of the second magnetic field.

19. A chamber according to claim 9, wherein:

the first north magnetic pole and the first south magnetic pole are positioned at one side of a geometric line bisecting the workpiece area; and

the second north magnetic pole and the second south magnetic pole are positioned at the opposite side of said geometric line bisecting the workpiece area.

20. A chamber according to claim 9, further comprising:

a plurality of electromagnets, wherein the plurality of electromagnets includes at least a first, a second, a third, and a fourth electromagnet at successively spaced positions around the periphery of the workpiece area; and

a power supply for providing electrical current to the electromagnets, wherein

the power supply provides a first current to at least the first and second electromagnets so as to produce said first north magnetic pole and said first south magnetic pole, and

the power supply provides a second current to at least the third and fourth electromagnets so as to produce said second south magnetic pole and said second north magnetic pole, wherein the second current is substantially less than the first current.

21. A chamber according to claim 9, further comprising:

at least four electromagnets at successively spaced positions around the periphery of the workpiece area; and

a power supply for simultaneously providing a first current and a second current to the electromagnets, wherein

the power supply provides the first current to at least two of the electromagnets so as to produce said first north magnetic pole and said first south magnetic pole, and

the power supply provides the second current to at least two of the electromagnets other than the two to which it provides the first current, wherein the second current is substantially less than the first current, so as to produce said second south magnetic pole and said second north magnetic pole;

wherein the power supply provides the first and second currents to successively positioned electromagnets at successive times so that the electromagnets collectively produce a magnetic field that rotates over time.

22. A magnetically enhanced plasma chamber for processing a semiconductor workpiece, comprising:

a workpiece support for holding the workpiece at a workpiece support area;

a plurality of electromagnets at positions spaced around the periphery of the workpiece support area; and

a power supply for providing to each respective electromagnet a respective current signal having successive fixed current values during successive time intervals so that the electromagnets in combination produce a magnetic field which rotates over time, wherein

each of said time intervals is separated by a transition time period during which the power supply is configured to change the value of the current it provides to the respective electromagnets,

during each transition period, to those electromagnets to which the power supply provides a current change which is a change in magnitude of current with unchanged polarity, the power supply is configured to provide said current change during a short portion of the transition period,

during each transition period, to those electromagnets to which the power supply provides a current change which includes a polarity reversal, the power supply is configured to provide said current change during a long portion of the transition period, and

each long portion of a transition period has a duration substantially longer than each short portion of the transition period.

23. A chamber according to claim 22, wherein:

each long portion of a transition period has a duration substantially equal to the transition period, and

each short portion of a transition period has a duration substantially equal to one-half the transition period.

24. A chamber according to claim 22, wherein:

during each transition period, to those electromagnets to which the power supply provides a current change which is an increase in magnitude of current with unchanged polarity, the power supply provides said current change during an initial segment of the transition period; and

during each transition period, to those electromagnets to which the power supply provides a current change which is a decrease in magnitude of current with unchanged polarity, the power supply provides said current change during an ending segment of the transition period.

25. A method of producing an ion flux from a plasma to the surface of a semiconductor workpiece, comprising the steps of:

holding a semiconductor workpiece having a flat surface;

producing a plasma in a region above the surface of the workpiece; and

producing a magnetic field in a planar region such that, at any point in the planar region, the direction of the magnetic field at that point is approximately the vector cross product of (i) the gradient of the magnitude of the magnetic field at that point, and (ii) a vector extending perpendicularly from the workpiece surface toward the plasma;

wherein the planar region is parallel to and adjacent to the workpiece surface and has a surface area which is at least half the surface area of the workpiece surface;

wherein, at every instant, the magnetic field has a range of magnitudes in the second region which ranges between a minimum magnitude and a maximum magnitude, wherein the minimum magnitude occurs at only a single point; and

wherein, at every instant, the magnetic field has a clockwise curvature relative to said single point when viewed from above the workpiece area.

26. A method of producing an ion flux from a plasma to a semiconductor workpiece, comprising the steps of:

holding a semiconductor workpiece having a surface bounded by a perimeter;

producing a plasma in a region above the surface of the workpiece;

providing a unitary magnet having a north magnetic pole and a south magnetic pole; and

positioning the magnet so as to position the north magnetic pole and south magnetic pole at distinct azimuths around the perimeter of the workpiece surface, wherein

each magnetic pole faces a direction which is more toward than away from the center of the workpiece surface, and

the azimuth of the north magnetic pole minus the azimuth of the south magnetic pole is substantially greater than zero and substantially less than 180°

degrees in a direction counterclockwise around said perimeter when viewing the workpiece area from above.

27. A method of producing an ion flux from a plasma to a semiconductor workpiece, comprising the steps of:

holding a semiconductor workpiece having a surface bounded by a perimeter;

producing a plasma in a region above the surface of the workpiece; and

positioning a first north magnetic pole, a first south magnetic pole, a second south magnetic pole, and a second north magnetic pole at respective azimuths around the perimeter of the workpiece surface which are progressively clockwise around the perimeter of the workpiece surface when viewing the workpiece surface from above, wherein

each magnetic pole faces a direction which is more toward than away from the center of the workpiece surface, and

the first north magnetic pole and first south magnetic pole in combination produce a first magnetic field between them, the second north magnetic pole and second south magnetic pole in combination produce a second magnetic field between them, and the first magnetic field is substantially stronger than the second magnetic field.

28. A method according to claim 27, further comprising the step of:

adjusting the ratio between the strength of the first magnetic field and the strength of the second magnetic field.

29. A method according to claim 27, wherein:

the step of positioning the first north magnetic pole and first south magnetic pole comprises the step of providing a first magnet having said first north pole and said first south pole; and

the step of positioning the second north magnetic pole and second south magnetic pole comprises the step of providing a second magnet having said second north pole and said second south pole.

30. A method according to claim 29, further comprising the step of:

adjusting the ratio between the strength of the magnetic field produced by the first magnet and the strength of the magnetic field produced by the second magnet.

31. A method according to claim 30, further comprising the steps of:

providing an electromagnet as one of the first and second magnets; and

supplying electrical current to the electromagnet;

wherein the step of adjusting said ratio comprises adjusting the amount of said electrical current supplied to the electromagnet.

32. A method according to claim 30, further comprising the steps of:

providing first and second electromagnets as said first and second magnets, respectively; and

supplying first and second electrical currents to the first and second electromagnets, respectively;

wherein the step of adjusting said ratio comprises adjusting the ratio between the first electrical current and the second electrical current.

33. A method according to claim 27, wherein the step of positioning the magnetic poles comprises the step of:

positioning four distinct electromagnets at the respective positions of the first north magnetic pole, first south magnetic pole, second north magnetic pole, and second south magnetic pole.

34. A method according to claim 33, further comprising the steps of:

supplying a first amount of electrical current to the first north electromagnet and the first south electromagnet;

supplying a second amount of electrical current to the second north electromagnet and the second south electromagnet; and

adjusting the ratio between the first amount of current and the second amount of current.

35. A method according to claim 27, wherein the step of positioning the magnetic poles further comprises the steps of:

orienting the first north magnetic pole and the second south magnetic pole so that their respective magnetic axes are parallel; and

orienting the second north magnetic pole and the first south magnetic pole so that their respective magnetic axes are perpendicular to the magnetic axes of the first north magnetic pole and the second south magnetic pole.

36. A method according to claim 27, further comprising the steps of:

positioning a plurality of electromagnets at successively spaced positions around the periphery of the workpiece surface;

supplying different electrical current signals to different ones of the electromagnets so as to produce said north and south magnetic poles; and

supplying each of said different electrical current signals to each of the electromagnets in succession so that the electromagnets produce a rotating magnetic field.

37. A method of claim 27, wherein the step of positioning the magnetic poles comprises the steps of:

positioning the first north magnetic pole and the first south magnetic pole at one side of a geometric line bisecting the workpiece surface; and

positioning the second north magnetic pole and the second south magnetic pole at the opposite side of said geometric line bisecting the workpiece surface.

38. A method according to claim 27, further comprising the steps of:

providing a plurality of electromagnets, wherein the plurality of electromagnets includes at least a first, a second, a third, and a fourth electromagnet at successively spaced positions around the periphery of the workpiece area;

supplying a first current to at least the first and second electromagnets so as to produce said first north magnetic pole and said first south magnetic pole; and

supplying a second current to at least the third and fourth electromagnets so as to produce said second south magnetic pole and said second north magnetic pole, wherein the second current is substantially less than the first current.

39. A method according to claim 27, further comprising the steps of:

positioning at least four electromagnets at successively spaced positions around the periphery of the workpiece area; and

simultaneously supplying a first current and a second current to the electromagnets, wherein the step of simultaneously supplying the first and second currents comprises the steps of

supplying the first current to at least two of the electromagnets so as to produce said first north magnetic pole and said furst south magnetic pole,

supplying the second current to at least two of the electromagnets other than the two to which the first current is supplied, wherein the second current is substantially less than the first current, so as to produce said second south magnetic pole and said second north magnetic pole, and

supplying the first and second currents to successively positioned electromagnets at successive times so that the electromagnets collectively produce a magnetic field that rotates over time.

40. A method of magnetically enhancing a plasma process performed on a semiconductor workpiece, comprising the steps of:

holding a semiconductor workpiece at a workpiece support area bounded by a perimeter;

positioning a plurality of electromagnets at positions spaced around the perimeter of the workpiece support area; and

supplying to each respective electromagnet a respective electrical current signal having successive fixed current values during successive time intervals so that the electromagnets in combination produce a magnetic field which rotates over time, wherein each of said time intervals is separated by a transition time period during which the respective values of the current supplied to the respective electromagnets are changed, and wherein the supplying step includes the steps of

during each transition period, to those electromagnets to which the change in supplied current is a change in magnitude of current with unchanged polarity, supplying said current change during a short portion of the transition period, and

during each transition period, to those electromagnets to which the change in supplied current includes a polarity reversal, supplying said current change during a long portion of the transition period,

wherein each long portion of a transition period has a duration substantially longer than each short portion of the transition period.

41. A method according to claim 40, wherein:

each long portion of a transition period has a duration substantially equal to the transition period, and

each short portion of a transition period has a duration substantially equal to one-half the transition period.

42. A method according to claim 40, wherein the supplying step comprises the steps of:

during each transition period, to those electromagnets to which the change in supplied current is an increase in magnitude of current with unchanged polarity, supplying said current change during an initial segment of the transition period; and

during each transition period, to those electromagnets to which the change in supplied current is a decrease in magnitude of current with unchanged polarity, supplying said current change during an ending segment of the transition period.