Distributed system and code for control and automation of plasma immersion ion implanter

• US 6,113,735 A
• Filed: 03/01/1999
• Issued: 09/05/2000
• Est. Priority Date: 03/02/1998
• Status: Expired due to Term

• Current Assignee: Silicon Genesis
• Original Assignee: Silicon Genesis
• Inventors: Chu, Paul K., Liu, A. G.
• Primary Examiner(s): DANG, THI D
• Application Number:
  US09/260,191
• Time in Patent Office: 554 Days
• Field of Search: 156/345, 118/723 R
• US Class Current: 156/345.28
• CPC Class Codes: H01J 37/321 the radio frequency energy being inductively coupled to the plasma
• CPC Class Codes: H01J 37/32412 Plasma immersion ion implantation
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge

Abstract

A plasma immersion implantation system (100), including a network for controlling the system. The network communicates to the system by way of packets, which are used to pass signals to and from one of a plurality of controllers. The controllers are used to oversee one of a plurality of processing parameters or field processes such as rf voltage, pressure, etc.

Claims

1. A plasma treatment system for implantation, said system comprising:

a chamber in which a plasma is generated in said chamber;

a susceptor disposed in said chamber, said susceptor being capable of holding a workpiece to be processed;

a first control station coupled to a rf voltage source for providing an electromagnetic field used to maintain said plasma discharge in said chamber;

a second control station a voltage modulator source for biasing said plasma discharge relative to said susceptor to accelerate a plurality of charged particles from said plasma into said workpiece; and

a management station coupled to said first control station and coupled to said second control station.

2. The system of claim 1 wherein said management station comprises a network card, said network card coupling said first control station to said management station.

3. The system of claim 1 wherein said management station comprises a network card, said network card coupling said first control station to said management station.

4. The system of claim 1 further comprising a tuning circuit, said tuning circuit electrically connected to said rf voltage source.

5. The system of claim 1 wherein said management station and said first control station being coupled through a conductive member.

6. The system of claim 1 wherein said management station is substantially free from electromagnetic interference from said rf voltage source.

7. The system of claim 1 wherein said management station is substantially free from electromagnetic interference from said voltage modulator source.

8. The system of claim 1 wherein said management station receives telecommunication signals from said first control station.

9. The system of claim 1 wherein said management station receives telecommunication signals from said second control station.

10. The system of claim 1 wherein said first control station provide control signals to said rf voltage source.

11. The system of claim 1 wherein said system is provided in a cluster tool.

12. The system of claim 1 wherein said management station communicates to said first station by passing a plurality of first packets to and from said first control station.

13. The system of claim 1 wherein said management station communicates to said second station by passing a plurality of second packets to and from said second control station.

14. A plasma immersion implantation system comprising:

a management station comprising a computer memory, said computer memory including a first code directed to transmit a plurality of first packets between said management station and at least one of a plurality of controllers, said one of said controllers being coupled to a field process to adjust said field process using an analog control signal.

15. The system of claim 14 wherein said management station comprises a personal comptuer, said personal computer including a microprocessor device.

16. The system of claim 14 wherein said management station is substantially free from any interference from electromagnetic radiation caused by said field process.

17. The system of claim 14 wherein said field process is selected from a high voltage source, a high voltage rf source, and a voltage modulator.