Transparent substrate provided with at least one thin layer based on silicone nitride or oxynitride and the process for obtaining it
First Claim
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1. A coated glass substrate, comprising a glass substrate and at least one thin layer based on silicon nitride or silicon oxynitride, wherein said thin layer comprises the elements Si, O, N, and C in the following atomic percentages:
- Si;
from 30 to 60%;
N;
from 10 to 56%;
O;
from 1 to 40%; and
C;
from 1 to 40% and has been deposited on said substrate by gas-phase pyrolysis at a temperature ranging from 550 to 760°
C.
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Abstract
The invention relates to a coated glass substrate, covered with at least one thin layer based on silicon nitride or silicon oxynitride. The thin layer contains the elements Si, O, N, C in the following atomic percentages:
Si: from 30 to 60%,
N: from 10 to 56%,
O: from 1 to 40%,
C: from 1 to 40%.
The invention also relates to the process for obtaining the coated glass substrate using a gas-phase pyrolysis technique, and to its applications.
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Citations
17 Claims
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1. A coated glass substrate, comprising a glass substrate and at least one thin layer based on silicon nitride or silicon oxynitride, wherein said thin layer comprises the elements Si, O, N, and C in the following atomic percentages:
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Si;
from 30 to 60%;N;
from 10 to 56%;O;
from 1 to 40%; andC;
from 1 to 40% and has been deposited on said substrate by gas-phase pyrolysis at a temperature ranging from 550 to 760°
C. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. An article or glazing assembly, comprising a glass substrate coated with a thin layer based on silicon nitride or silicon oxynitride, wherein the thin layer comprises the elements Si, O, N, and C in the following atomic percentages:
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Si;
from 30 to 60%;N;
from 10 to 56%;O;
from 1 to 40%; andC;
from 1 to 40%. - View Dependent Claims (17)
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Specification