Nonvolatile semiconductor memory cell with select gate
First Claim
Patent Images
1. An electrically erasable programmable read only memory (EEPROM) cell comprising:
- a semiconductor substrate;
a tunnel dielectric layer formed over the substrate;
a floating gate transistor having a floating gate formed over the tunnel dielectric and a control gate formed over the floating gate; and
a select transistor having a first gate formed over the tunnel dielectric, a second gate formed over the first gate, the second gate electrically connected to the first gate by a conductive layer formed over the first and second gates.
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Abstract
An electrically erasable programmable read only memory (EEPROM) cell including a tunnel dielectric layer formed over a semiconductor substrate. The EEPROM cell may have a floating gate transistor and a select transistor. The floating gate transistor may have a floating gate formed over the tunnel dielectric and a control gate formed over the floating gate. The select transistor may have a first gate formed over the tunnel dielectric and a second gate formed over the first gate. The second gate may be electrically connected to the first gate.
71 Citations
21 Claims
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1. An electrically erasable programmable read only memory (EEPROM) cell comprising:
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a semiconductor substrate; a tunnel dielectric layer formed over the substrate; a floating gate transistor having a floating gate formed over the tunnel dielectric and a control gate formed over the floating gate; and a select transistor having a first gate formed over the tunnel dielectric, a second gate formed over the first gate, the second gate electrically connected to the first gate by a conductive layer formed over the first and second gates. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method of forming an electrically erasable programmable read only memory (EEPROM) cell comprising:
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forming a tunnel dielectric over a semiconductor substrate; forming a floating gate transistor over the tunnel dielectric, the floating gate transistor configured to store charge; and forming a select transistor over the tunnel dielectric, the select transistor having a first and second gate electrically connected together by a conductive layer formed over the first and second gates. - View Dependent Claims (10, 11, 12, 13, 14)
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15. A memory device comprising:
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a first electrically erasable programmable read only memory (EEPROM) cell comprising; a first select transistor overlying a tunnel dielectric layer and having select and control gates electrically coupled together by a conductive layer formed thereover and being coupled to a first word line; and a first floating gate transistor, the first floating gate transistor comprising a first control gate and a first floating gate; a second EEPROM cell coupled to the first EEPROM cell comprising; a second select transistor coupled to a second independent word line; and a second floating gate transistor comprising a second control gate and a second floating gate; and circuitry coupled to the first floating gate transistor and the second floating gate transistor, the circuitry providing a common read voltage to the first and second control gates for reading data stored on the first floating gate. - View Dependent Claims (16, 17, 18, 19)
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- 20. A method of programming an electrically erasable programmable read only memory (EEPROM) cell having a select transistor coupled to a bit line and a floating gate transistor having a control gate and a floating gate, the method comprising applying a negative voltage to the control gate of the floating gate transistor, a first positive voltage to the bit line, and a second positive voltage to a gate of the select transistor.
Specification