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Fabrication of two-dimensionally arrayed quantum device

  • US 6,121,075 A
  • Filed: 01/11/1999
  • Issued: 09/19/2000
  • Est. Priority Date: 05/30/1997
  • Status: Expired due to Term
First Claim
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1. A method of fabricating single-electron transistor comprising quantum dots formed from microscopic metal particles of which transition level nearest to the Fermi level is higher than the thermal excitation level of electron at room temperature, said method comprising the steps of:

  • (a) adsorbing a metalloprotein complex onto an LB membrane developed on a surface of an aqueous solution;

    (b) placing said LB membrane having said metalloprotein complex adsorbed thereon on a substrate which is durable to temperatures beyond the burn-out temperature of said protein and having an insulation layer at least on the surface thereof;

    (c) burning out said protein through heat treatment in an inert gas that does not react with said substrate; and

    (d) reducing said metalloprotein complex thereby to obtain metal atom aggregates; and

    (e) irradiating said metal atom aggregates with electron beam of a scanning electron microscope, of which beam width is set to be not greater than said pitch, in vacuum in the presence of a trace of carbon compound, while scanning said electron beam to have carbon vapor-deposited between said metal atom aggregates thereby forming lead wires.

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