Shield to prevent cryopump charcoal array from shedding during cryo-regeneration

• US 6,122,921 A
• Filed: 01/19/1999
• Issued: 09/26/2000
• Est. Priority Date: 01/19/1999
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Brezoczky, Thomas, Narasimhan, Murali
• Primary Examiner(s): DOERRLER, WILLIAM CHARLES
• Application Number:
  US09/233,393
• Time in Patent Office: 616 Days
• Field of Search: 62/55.5
• US Class Current: 62/55.5
• CPC Class Codes: F04B 37/085 Regeneration of cryo-pumps

Abstract

The present invention provides a regeneration shield 22 for a vacuum system, typically used in the processing of integrated circuits. The regeneration shield protects fragile arrays 13, having a dislocatable material 16, such as charcoal, in a high vacuum pump 4 from volatile regeneration gases, which impinge the fragile material on the array and dislocate that material to cause pumping inefficiencies and scrap. The shield may be planar, concave, or convex and may have sides. The shield may also have inwardly and outwardly extending flanges.

Claims

1. A vacuum system having a regeneration shield, comprising:

a) a processing chamber;

b) at least one vacuum pump connected to the processing chamber comprising a first stage array forming an internal volume and a second stage array disposed substantially within the internal volume of the first stage array, at least a portion of the first stage array being disposed between an inlet of the pump and the second stage array;

c) a dislocatable material attached to the second stage array and disposed at least partially toward the first stage array; and

d) a mechanical regeneration shield interposed between the second stage array and the first stage array, the shield adapted to shield the second stage array from gases produced during regeneration of the pump.

2. The system of claim 1, wherein the second stage array comprises one or more vertically inclined plates aligned substantially perpendicular to a direction of flow into the pump and wherein a centerline through the inclined plates is substantially horizontal.

3. The system of claim 1, wherein the dislocatable material comprises charcoal.

4. The system of claim 2, wherein the dislocatable material is disposed on a side of the second stage array distal from the processing chamber.

5. The system of claim 1, wherein the regeneration shield is disposed substantially parallel to a centerline through the second stage array.

6. The system of claim 1, wherein the second stage array comprises a plurality of plates that support the dislocatable material and wherein the regeneration shield is adapted to shield the dislocatable material on the plurality of plates.

7. The system of claim 1, wherein the shield comprises a substantially open top inwardly disposed radially toward the second stage array and disposed at least partially around a perimeter of the second stage array.

8. The system of claim 1, wherein the shield comprises a substantially open top outwardly disposed toward a perimeter of the pump in a radial direction away from the second stage array.

9. The system of claim 7, wherein the shield comprises inwardly extending flanges disposed radially at least partially around the second stage array, the flanges forming one or more open spaces therebetween.

10. The system of claim 8, wherein the shield comprises outwardly extending sides disposed toward a perimeter of the pump in a radial direction away from the second stage array.

11. The system of claim 1, wherein at least a portion of the shield is positioned at an elevation above a liquid level of regeneration gases collected in the pump during regeneration of the pump.

12. The system of claim 2, wherein at least a portion of the shield is positioned at an elevation above a liquid level of regeneration gases collected in the pump during regeneration of the pump.

13. The system of claim 1, wherein the chamber comprises a physical vapor deposition (PVD) chamber.

21. The system of claim 1, wherein an axis through the centerline of the second stage array is horizontally aligned.

14. A method of protecting a processing chamber from a dislocatable material, comprising:

a) at least partially evacuating the processing chamber utilizing a vacuum pump having at least a first stage array and a second stage array disposed within an internal volume formed by the first stage array, the second stage array having dislocatable material attached thereto and disposed at least partially toward the first stage array;

b) flowing gases into the vacuum pump;

c) creating a restriction in the vacuum pump;

d) regenerating the vacuum pump; and

e) shielding the dislocatable material on the second stage array from regeneration gases produced during regenerating the vacuum pump.

17. The method of claim 14, wherein regenerating the vacuum pump comprises at least partially deicing the array.

18. The method of claim 17, further comprising orienting the shield to shed liquefied gases produced during regenerating the vacuum pump.

19. The method of claim 14, further comprising elevating at least a portion of the shield above a liquid level of regeneration gases collected in the pump during regeneration of the pump.

15. A method of protecting a processing chamber from a dislocatable material, comprising:

a) at least partially evacuating the processing chamber utilizing a vacuum pump having at least one array having dislocatable material;

b) flowing gases into the vacuum pump;

c) creating a restriction in the vacuum pump;

d) regenerating the vacuum pump;

g) shielding the dislocatable material on the array from regeneration gases produced during regenerating the vacuum pump; and

f) reducing an amount of the dislocatable material from entering the chamber by utilizing the shield.

16. A method of protecting a processing chamber from a dislocatable material, comprising:

a) at least partially evacuating the processing chamber utilizing a vacuum pump having at least one array having dislocatable material;

b) flowing gases into the vacuum pump;

c) creating a restriction in the vacuum pump;

d) regenerating the vacuum pump;

e) shielding the dislocatable material on the array from regeneration gases produced during regenerating the vacuum pump; and

f) allowing a portion of the dislocatable material to the dislocated from the array and collecting a dislocated portion of the dislocatable material in the shield.

20. A cryogenic vacuum pump for a substrate processing system, the pump having a regeneration shields comprising:

a) a first stage array forming an internal volume and a second stage array disposed at least partially within the internal volume of the first stage array, at least a portion of the first stage array disposed between an inlet of the pump and the second stage array;

b) a dislocatable material attached to the second array and disposed at least partially toward the first array; and

c) a mechanical regeneration shield interposed between the first stage array and the second stage array wherein the regeneration shield is adapted to shield the dislocatable material from regeneration gases produced during regeneration of the pump.