Method of visually inspecting positioning of a pattern on a substrate
First Claim
1. A method of visually inspecting positioning of a pattern on a substrate and/or the size of a pattern on a substrate comprising:
- a) providing a patterned substrate to be inspected;
b) placing thereon a mask having a pattern corresponding to the pattern of the substrate to be inspected made by the method comprising;
i) providing a transparent substrate which is substantially unaffected by a laser beam;
ii) forming an opaque mask pattern forming layer having a thickness of about 10 Å
to 5000 Å
on the substrate, the mask pattern forming layer being a material which absorbs the laser beam;
iii) exposing the layered substrate to the laser beam in a predetermined pattern to etch the desired mask pattern in the mask pattern forming layer; and
c) visually inspecting said patterned substrate using said mask.
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Abstract
Exposure masks and inspection masks for use in the electronics field may be made using laser beams wherein the mask comprises a substrate which is substantially unaffected by exposure to the laser beam and an opaque pattern forming layer on the substrate, which pattern forming layer absorbs the laser beam and is selectively etched when exposed to the laser beam. A preferred mask has an overcoat transparent layer. A cavity inspection mask is provided having a series of openings in the form of lines formed in the opaque pattern forming layer, the lines bounding the cavity walls, is the mask being used for determining if the cavity is centrally positioned on the substrate and/or that the cavity is of the desired size. Substrates containing identifying masks thereon which cannot be seen by the unaided eye for theft deterrence are also provided.
30 Citations
4 Claims
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1. A method of visually inspecting positioning of a pattern on a substrate and/or the size of a pattern on a substrate comprising:
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a) providing a patterned substrate to be inspected; b) placing thereon a mask having a pattern corresponding to the pattern of the substrate to be inspected made by the method comprising; i) providing a transparent substrate which is substantially unaffected by a laser beam; ii) forming an opaque mask pattern forming layer having a thickness of about 10 Å
to 5000 Å
on the substrate, the mask pattern forming layer being a material which absorbs the laser beam;iii) exposing the layered substrate to the laser beam in a predetermined pattern to etch the desired mask pattern in the mask pattern forming layer; and c) visually inspecting said patterned substrate using said mask. - View Dependent Claims (2)
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3. A method of visually inspecting positioning of a pattern on a substrate and/or the size of a pattern on a substrate comprising:
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a) providing a patterned substrate to be inspected; b) placing thereon a mask having a pattern corresponding to the pattern of the substrate to be inspected made by the method comprising; i) providing a transparent substrate which is substantially unaffected by the laser beam; ii) forming an opaque mask pattern forming layer having a thickness of about 10 Å
to 5000 Å
on the surface of the transparent substrate, the opaque mask pattern forming layer being a material which absorbs the laser beam; andiii) exposing said opaque mask forming layer to the laser beam in a mask pattern to etch the mask pattern in the opaque mask pattern forming layer;
wherein the mask pattern comprises a plurality of connected circular openings etched in the opaque mask pattern forming layer;c) visually inspecting said patterned substrate using said mask. - View Dependent Claims (4)
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Specification