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Manufacturing method of active matrix substrate, active matrix substrate and liquid crystal display device

  • US 6,127,199 A
  • Filed: 07/10/1998
  • Issued: 10/03/2000
  • Est. Priority Date: 11/12/1996
  • Status: Expired
First Claim
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1. A method of manufacturing an active matrix substrate comprising a pixel portion including thin film transistors connected to scanning lines and signal lines arranged in a matrix, and pixel electrodes connected to terminals of the thin film transistors, the method comprising the steps of:

  • forming a separation layer on a substrate;

    forming the thin film transistors over the separation layer;

    forming an insulation film on the thin film transistors and over the separation layer;

    selectively removing at least a portion of the insulation film where each of the pixel electrodes is to be formed;

    forming each of the pixel electrodes on the insulation film and the separation layer in the region where at least a portion of the insulation film has been removed;

    adhering the thin film transistors to a transfer material with an adhesive layer;

    producing exfoliation in the separation layer and/or at an interface of the separation layer and the substrate to separate the substrate from the separation layer; and

    removing any portion of the separation layer remaining on the pixel electrodes to form an active matrix substrate using the transfer material as a new substrate.

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